多模式交变耦合磁场辅助电弧离子镀弧源设计  

Novel Arc-Spot Control Unit in Arc Ion Plating Assisted by Multi-Mode AC Magnetic Fields

作　　者：郎文昌[1] 赵战锋[1] 杜昊[2] 高斌[1] 王向红[1] 程岐生 

机构地区：[1]温州职业技术学院材料成型工艺与模具技术重点实验室,温州325035 [2]中国科学院金属研究所材料表面工程研究部,沈阳110016 [3]中山市昊源电器设备有限公司,中山528447

出　　处：《真空科学与技术学报》2015年第8期913-918,共6页Chinese Journal of Vacuum Science and Technology

基　　金：浙江省自然科学基金项目(LQ12E01003);浙江省科技厅公益计划项目(2012C21099)

摘　　要：采用有限元模拟对多模式交变耦合磁场进行了优化设计,介绍了多波形电磁线圈控制电源的原理,并对按此原理制作的电源进行了测试,分析讨论了不同波形励磁电流条件下磁场对于弧斑运动的影响,提出了一种多模式交变耦合磁场辅助电弧离子镀弧源设计原理及方案。研究表明:轴对称发散磁场有推动弧斑向外扩展的趋势,轴对称拱形磁场将弧斑约束在固定的轨道,反极性聚焦导引磁场有约束弧斑在靶材中心的趋势,多模式反极性动态聚焦导引磁场与轴对称发散磁场或者拱形磁场叠加,可形成动态的拱形耦合磁场,动态的控制弧斑运动,改善弧斑放电状态,减少颗粒发射;在聚焦磁场引导下,等离子体稳定的传输,同时可以增强等离子体的粒子碰撞机率,提高离化率和离子密度。反极性动态聚焦导引磁场线圈由多波形电磁线圈控制电源驱动,可输出频率、幅值单独可调的直流及直流偏置的三角波、矩形波、馒头波、正弦波及其他形式的交变电流,实现对弧斑的多种模式控制。A novel arc-spot control unit was developed for the arc ion plating（ AIP） assisted by multi-mode AC magnetic fields. The impact of the magnetic fields,generated in different modes,on the arc-spot＇s motion was modeled,simulated in finite element method and tested in growth of Ti N-coatings. The simulated results show that the magnetic fields significantly improves AIP performance. To be specific,the axial-symmetric diverging magnetic field pushes the arc-spots outwards; the axial-symmetric arched magnetic field confines the arc-spot trajectory; and the dynamical focusing magnetic field in reversed polarity,driven independently by the coil-currents with differrent wave-shapes,frequencies and amplitudes,drags the arc-spot to the center and increases the ionization rate and ion density because of steady plasma transport and enhanced collision probability,and as shown in the tersted results,its superposition with the diverging and / or arched magnetic fileds is capable of dynamically controlling arc-spot motion,improving arc-spot discharge and reducing particle emission.

关 键 词：多模式交变耦合磁场 离子镀弧源 轴对称发散磁场 多模式反极性动态聚焦导引磁场 动态拱形耦合磁场 

分 类 号：TB43[一般工业技术] TG174.4[金属学及工艺—金属表面处理]