多孔钛基掺硼金刚石电极结构对电催化降解阿司匹林性能的影响  

Effect of Structure of Ti/Boron-doped Diamond Electrode on the Electrochemical Degradation Performance for Aspirin

作　　者：黄卫民[1] 林海波[1] 

机构地区：[1]吉林大学化学学院,长春130012

出　　处：《高等学校化学学报》2015年第9期1765-1770,共6页Chemical Journal of Chinese Universities

基　　金：国家自然科学基金(批准号:21273097);吉林省重大科技攻关招标项目(批准号:20130204003GX);电分析化学国家重点实验室开放课题(2013)资助~~

摘　　要：利用扫描电子显微镜(SEM)和X射线衍射仪(XRD)对多孔Ti/BDD电极及传统平板Ti/BDD(BDD=钛基掺硼金刚石)电极进行了研究,通过循环伏安法考察了电极的背景电流和电化学窗口.以阿司匹林为模型污染物,研究了BDD电极结构对阿司匹林电催化降解的影响.结果表明,多孔Ti/BDD电极的总带电量,内、外部带电量,孔隙率和比表面积均高于平板Ti/BDD电极;多孔Ti/BDD在对COD和阿司匹林的去除率和能量消耗等方面均优于平板Ti/BDD电极.The surface morphology and crystal structure of three-dimensional 3D-porous titanium / boron-doped diamond（ porous Ti / BDD） and planar Ti / BDD electrodes were studied by scanning electron microscopy（ SEM） and X-ray diffraction（ XRD）. The cyclic voltammetry measurements of porous Ti/BDD and planar Ti / BDD electrodes were also performed. Porous Ti / BDD and planar Ti / BDD electrodes were used as anodes in the degradation of Aspirin,respectively. The results indicate that porous Ti / BDD has larger total,outer,and inner charges,porosity,and actual surface area due to the porous structure. Compared to planar Ti / PDD,porous Ti / BDD electrode is better on removal rate of chemical oxygen demand（ COD） and Aspirin and energy consumption.

关 键 词：多孔钛基体 掺硼金刚石薄膜电极 阿司匹林 电催化降解 

分 类 号：O646[理学—物理化学]