Influences of hydrogen dilution on microstructure and optical absorption characteristics of nc-SiO_x:H film  

作　　者：赵蔚 杜霖元 蒋昭毅 尹辰辰 于威 傅广生 

机构地区：[1]Hebei Key Laboratory of Optic-electronic Information Materials,College of Physics Science and Technology,Hebei University [2]School of Science,Hebei University of Engineering

出　　处：《Chinese Physics B》2015年第10期547-552,共6页中国物理B（英文版）

基　　金：Project supported by the Key Basic Research Project of Hebei Province,China(Grant No.12963930D);the Natural Science Foundation of Hebei Province,China(Grant Nos.F2013201250 and B2012402011)

摘　　要：By using the plasma enhanced chemical vapor deposition（PECVD） technique, amorphous silicon oxide films containing nanocrystalline silicon grain（nc-Si O x：H） are deposited, and the bonding configurations and optical absorption properties of the films are investigated. The grain size can be well controlled by varying the hydrogen and oxygen content,and the largest size is obtained when the hydrogen dilution ratio R is 33. The results show that the crystallinity and the grain size of the film first increased and then decreased as R increased. The highest degree of crystallinity is obtained at R = 30.The analyses of bonding characteristics and light absorption characteristics show that the incorporation of hydrogen leads to an increase of overall bonding oxygen content in the film, and the film porosity first increases and then decreases. When R = 30, the film can be more compact, the optical absorption edge of the film is blue shifted, and the film has a lower activation energy.By using the plasma enhanced chemical vapor deposition（PECVD） technique, amorphous silicon oxide films containing nanocrystalline silicon grain（nc-Si O x：H） are deposited, and the bonding configurations and optical absorption properties of the films are investigated. The grain size can be well controlled by varying the hydrogen and oxygen content,and the largest size is obtained when the hydrogen dilution ratio R is 33. The results show that the crystallinity and the grain size of the film first increased and then decreased as R increased. The highest degree of crystallinity is obtained at R = 30.The analyses of bonding characteristics and light absorption characteristics show that the incorporation of hydrogen leads to an increase of overall bonding oxygen content in the film, and the film porosity first increases and then decreases. When R = 30, the film can be more compact, the optical absorption edge of the film is blue shifted, and the film has a lower activation energy.

关 键 词：nc-SiOx：H MICROSTRUCTURE optical absorption 

分 类 号：O484[理学—固体物理]