组氨酸/石墨烯修饰玻碳电极循环伏安法测定痕量铜(Ⅱ)  

Determination of Trace Cu(Ⅱ)by Cyclic Voltammetry Using Histidine/Graphene Modified Glassy Carbon Electrode

作　　者：王斌[1] 黄骏[1] 王洪海[2] 

机构地区：[1]宿迁学院三系,宿迁238000 [2]扬州环境资源职业技术学院,扬州225127

出　　处：《理化检验（化学分册）》2015年第9期1232-1236,共5页Physical Testing and Chemical Analysis(Part B:Chemical Analysis)

摘　　要：依次用滴涂法和电化学方法将石墨烯和组氨酸修饰在玻碳电极表面,制备了组氨酸/石墨烯修饰的玻碳电极,将该电极用于循环伏安法测定铜（Ⅱ）。由于石墨烯良好的导电性能以及组氨酸的配位吸附效应,铜（Ⅱ）在该修饰电极上的氧化峰电流相对于裸玻碳电极上的显著增大。在最佳条件下,铜（Ⅱ）的浓度在2.30×10^-8~3.06×10^-5 mol·L^-1范围内与其氧化峰电流呈线性关系,测定下限（10S/N）为1.50×10^-9 mol·L^-1。此方法应用于实际样品中痕量铜（Ⅱ）的测定,加标回收率在94.0%~102%之间,测定值的相对标准偏差（n=10）为2.0%,本法测定值与原子吸收光谱法测定值相符。The surface of a glassy carbon electrode was modified successively with grapheme and histidine by drop-coating method and electrochemical method.The modified glassy carbon electrodes was used to measure Cu（Ⅱ）by cyclic voltammetry.The oxidation peak current of Cu（Ⅱ）on the modified electrode increased significantly in comparison with bare glassy carbon electrode,because of the better electrical conductivity of graphene and the coordination adsorption effect of histidine.Under optimized conditions,the linear relationship between oxidation peak current and the concentration of Cu（Ⅱ）was in the range of 2.30×10^-8-3.06×10^-5 mol·L^-1,with a limit of quantification（10S/N）of 1.5×10^-9 mol·L^-1.The method was used to measure samples,giving recovery rates by standard addition method in the range of 94.0%-102% and RSD（n=10）of 2%.The result obtained by this method was consistent with that of atomic absorption spectrometry.

关 键 词：循环伏安法 石墨烯 组氨酸 铜(Ⅱ) 

分 类 号：O657.14[理学—分析化学]