基于CFD研究釉浆压力对陶瓷静电施釉的影响  

Effect of Pressure on Electrostatic Glazing Based on CFD Analysis

作　　者：徐晗[1] 吴琦[1] 韩文[1] 徐磊[1] 

机构地区：[1]景德镇陶瓷学院机械电子工程学院,景德镇333403

出　　处：《硅酸盐通报》2015年第9期2691-2695,2701,共6页Bulletin of the Chinese Ceramic Society

摘　　要：针对陶瓷在施釉过程中,制品表面釉滴分布不均匀的问题,采用欧拉-拉格朗日法构建了在静电场力作用下的DPM模型,并基于CFD软件分析了1.5 bar、2.5 bar和5 bar三种压力情况下静电施釉过程中釉滴的粒径和运动速度分布情况。结果表明:在静电场作用和不同的压力作用下,可使得喷枪的雾化效果发生改变,能得到不同大小、不同均匀程度的釉滴粒径,并能获得不同釉滴的运动速度和分布。其中在施加2.5 bar压力条件下釉滴粒径均匀,釉浆雾化的效果最好。In the process of ceramic glazing, for the problem of uneven distribution of glaze drips on the ceramic product surface, using the method of Euler-Lagrange to build DPM model under the action of electrostatic field force, in electrostatic ceramic glazing process of three pressure conditions of 1.5 bar,2 5 bar and 5 bar based on CFD software to analysis glaze drips particle diameter and velocity distribution. The results show that, the electrostatic field and different pressure make the atomization effect of the spray gun to change, being able to obtain the different size and uniformity of the glaze particle diameter, and obtain the velocity and distribution of different glaze drips. Under which conditions applied pressure 2.5 bar glaze drips uniform particle diameter, glaze atomization best.

关 键 词：压力 静电场 施釉 釉滴 CFD 

分 类 号：TQ174[化学工程—陶瓷工业]