热处理温度对Ni-Mn-Ga-Co薄膜性能的影响  

The Influence of Heat Treatment Temperature on the Ni-Mn-Ga-Co Film Performance

作　　者：张馨[1] 张敏刚[1] 郭艳萍[1] 孙娜[1] 宫长伟[1] 陈峰华[1] 

机构地区：[1]太原科技大学材料科学与工程学院,山西太原030024

出　　处：《山西冶金》2015年第4期9-11,共3页Shanxi Metallurgy

基　　金：教育部高校博士点基金(20101415110003);山西省回国留学人员科研资助项目(2013-098);山西省研究生创新项目(20133114);太原科技大学大学生创新创业项目(xj2013055);太原科技大学校青年基金(20123002);太原科技大学研究生科技创新项目(20125005)

摘　　要：采用磁控溅射技术在P型Si(100)基片上制备了掺杂Co的Ni-Mn-Ga薄膜,对制得的薄膜进行不同温度的热处理,并分析研究各种薄膜的表面形貌以及磁性能的异同。研究发现:在不同的退火温度下,Ni-MnGa-Co薄膜表面颗粒的生长都比较均匀;薄膜在1 073 K退火1 h的情况下,磁性能最强,随着退火温度的变高或变低,磁性能都有所减弱;当退火温度为1 073 K时,居里温度最高,为350 K。This thesis applies the magnetron sputtering technique which prepares Ni-Mn-Ga-Co alloy films on the P Type substrate. The films are heat-treated at different temperatures, and based on which, the magnetic properties and surface profile of the alloy films are studied. The study finds that under different annealing temperature,the surface of the particles of Ni-Mn-Ga-Co film grows uniform. In the case of annealing at 1 073 K for 1 h, the films have the strongest magnetic property. With the annealing temperature becoming higher or lower, the magnetic property has weakened. When the annealing temperature is 1 073 K, the Curie temperature becomes highest,reaching 350 K.

关 键 词：Ni-Mn-Ga-Co薄膜 退火温度 磁性能 

分 类 号：TG156.2[金属学及工艺—热处理]