硅微粉的湿氧化损耗和表面钝化保护研究  

Surface Passivation Method for Resisting Wet Oxidation of Silicon Powders

作　　者：周小英[1] 

机构地区：[1]新余学院新能源科学与工程学院,江西新余338004

出　　处：《化学世界》2015年第4期225-228,共4页Chemical World

摘　　要：硅微粉在水溶液中的损耗主要包括湿氧化及硅溶解过程,对其表面钝化处理可减少水对硅微粉的腐蚀。采用1%H2O2溶液对硅微粉钝化处理后其表面形成致密、光滑的钝化层,钝化表层的悬挂键Si-O-Si和Si-H有利于阻止水对硅微粉的湿氧化损耗。经钝化处理的硅微粉在水溶液中浸泡48h后损耗率少于1%,与未经钝化处理的硅微粉在相同条件下损耗率超过20%相比,表面钝化处理对减少硅粉湿氧化损耗能发挥有效作用。Silion loss in aqueous solution mainly results from wet oxidation and dissolution. The Si surface was passivated to reduce the loss of silicon in water. A compact and smooth passivated layer was formed on the surface of silicon powder immersed in 1% H2O2 solution. There are higher concentrations of Si-O-Si and Si-H on the surface of the passivatied layer compared to the native oxide layer. Surface passivation treatment has a good effect on reducing loss of silicon, and the results show that the loss rate is less than 1% for passivated silicon dusts while it is more than 20% for unpassivated silicon dusts in water and at room temperature for 48 h.

关 键 词：硅微粉 湿氧化 表面钝化 

分 类 号：TG18[金属学及工艺—金属学]