平面研磨中磁粒刷运动轨迹规划的试验研究  

Experimental Study on Planning the Trajectory of Magnetic Abrasive Brush in Plane Finishing

作　　者：焦安源[1] 全洪军 邹艳华[3] 

机构地区：[1]辽宁科技大学应用技术学院,辽宁鞍山114051 [2]辽宁科技大学机械工程与自动化学院,辽宁鞍山114051 [3]宇都宫大学大学院工学部

出　　处：《机械设计与制造》2015年第10期84-87,共4页Machinery Design & Manufacture

基　　金：鞍山市科技项目(201209)

摘　　要：在磁力研磨工艺中,磁粒刷的运动轨迹直接影响工件的表面精度和均匀性。在自行设计的试验装置上,通过施加公转运动方式优化磁粒刷运动轨迹并进行试验研究,对研磨前后工件的表面粗糙度、横截面形状及3D微观形貌等进行检测与对比。结果表明:优化研磨轨迹后,表面质量和平面均匀性均较传统工艺有不同程度的提高,且当磁粒刷公转半径大于自转半径时效果最好。另外,还建立了研磨粒子的轨迹表达式,通过Graph软件对轨迹仿真分析,与试验结果相一致,因此可以针对工件形状和表面质量要求,预先规划合理研磨轨迹。In the magnetic abrasive finishing（MAF）process,the trajectory of magnetic abrasive brush（MAB）directly affects the surface precision and homogeneity. The experimental study is conducted based on a newly self-designed experiment device through attaching revolution motion to MAB to optimize the trajectory. The surface roughness,cross-sectional shape and 3D micro-morphology are detected and contrasted after polishing. The results show that： the plane homogeneity and quality are improved in varying degrees after optimizing the polishing trajectory and the effect is the best when the revolution radius is larger than rotation radius. In addition,the trajectory expression of magnetic abrasive particles（MAP）is established,and the trajectory is simulated by Graph software,which is consistent with the experimental results. Therefore,the polishing trajectory can be reasonable planned previously according to the requirements of workpiece profile and surface quality.

关 键 词：磁力研磨 磁粒刷 均匀性 表面质量 

分 类 号：TH16[机械工程—机械制造及自动化] TH580.68