聚焦离子束刻蚀制造三维软刻蚀母模板的研究  

Fabrication of the Three- dimensional Master for Soft Lithography by Focused Ion Beam Etching

作　　者：秦美霞 张继成[2] 易勇[1] 曾勇[2] 王红斌[2] 

机构地区：[1]西南科技大学材料科学与工程学院,四川绵阳621010 [2]中国工程物理研究院激光聚变研究中心,四川绵阳621900

出　　处：《西南科技大学学报》2015年第3期81-84,共4页Journal of Southwest University of Science and Technology

基　　金：中国工程物理研究院科研设备能力提升研究课题资助(2014A0408)

摘　　要：研究了一种基于聚焦离子束(FIB)刻蚀法制备软刻蚀用母模板的新方法。该方法采用FIB刻蚀技术在Si基底上制备出15μm×15μm的轮廓清晰的三维结构作为弹性印章的母模板,三甲基氯硅烷(TMCS)作为抗黏连层旋涂于Si基底表面,其后旋涂聚二甲基硅氧烷(PDMS)预聚物复制模铸出与Si基底相反的微三维结构。通过接触角测量仪检测Si样品表面疏水性能,并用原子力显微镜(AFM)对PDMS样品形貌进行检测。研究结果表明,特征图形得到了很好的转移。该方法相对于传统软刻蚀母模板制备方法,加工的三维结构具有操作步骤简单、制备周期短的特点,是一种有效的制备软刻蚀母模板方法。In this research,we used a new method based on focused ion beam（ FIB） etching to fabricate master mold for soft lithography. Three- dimensional structures with an area of 15 μm × 15 μm as the master of elastic stamps were successfully fabricated on the silicon substrate by FIB etching. Trimethyl chlorosilane（ TMCS） as an anti- adhesion layer was spin coated on the silicon substrate,and polydimethylsiloxane（ PDMS） prepolymer was spin coated on the TMCS and then replicated the adverse of the micro three- dimensional structures of Si specimen. The surface hydrophobic performance of Si specimen was tested by the contact angel measurement instrument and the morphology of PDMS sample surface was tested by atomic force microscope（ AFM）. The results show that the feature structures were transferred effectively. Compared with other traditional methods,the operating procedure of the method was simpler and shorter preparation period,it was an effective method of preparation of master mold for soft lithography.

关 键 词：聚焦离子束(FIB) 软刻蚀技术(SL) 三维加工 聚二甲基硅氧烷(PDMS) 模板 

分 类 号：TN605[电子电信—电路与系统]