Relationship between bias voltage and microstructure as well as properties of CrAlYN films  

作　　者：付英英 李红轩 吉利 刘晓红 刘流 周惠娣 陈建敏 

机构地区：[1]State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences [2]University of Chinese Academy of Sciences [3]School of Life Science of Chemistry, Tianshui Normal University

出　　处：《Chinese Physics B》2015年第11期342-351,共10页中国物理B（英文版）

基　　金：supported by the National Basic Research Program of China(Grant No.2013CB632302);the National Natural Science Foundation of China(Grant No.51175491)

摘　　要：In this work, a series of CrA1YN films doped with 1 at.% yttrium were deposited by unbalanced reactive magnetron sputtering under different bias voltages, The effects of bias voltage on microstrncture and properties of the CrA1YN films were subsequently investigated. It is found that all the as-deposited films have similar chemical composition and crystalline structure. However, the bias voltage has significant impact on the mechanical properties and oxidation resistance of the resulting films. Namely, the film deposited at 100 V has the highest hardness and best oxidation resistance, which are mainly attributed to its denser structure and higher A1 content than others. In addition, the film obtained at 100 V exhibits superior oxidation resistance even at 1000℃, and good friction and wear properties at 600 and 800 ℃, and the latter two are mainly ascribed to the formation of compact transfer layer on the worn surfaces. However, this film experienced obvious wear loss at low testing temperatures （i.e., 200 and 400 ℃） due to the serious abrasive wear.In this work, a series of CrA1YN films doped with 1 at.% yttrium were deposited by unbalanced reactive magnetron sputtering under different bias voltages, The effects of bias voltage on microstrncture and properties of the CrA1YN films were subsequently investigated. It is found that all the as-deposited films have similar chemical composition and crystalline structure. However, the bias voltage has significant impact on the mechanical properties and oxidation resistance of the resulting films. Namely, the film deposited at 100 V has the highest hardness and best oxidation resistance, which are mainly attributed to its denser structure and higher A1 content than others. In addition, the film obtained at 100 V exhibits superior oxidation resistance even at 1000℃, and good friction and wear properties at 600 and 800 ℃, and the latter two are mainly ascribed to the formation of compact transfer layer on the worn surfaces. However, this film experienced obvious wear loss at low testing temperatures （i.e., 200 and 400 ℃） due to the serious abrasive wear.

关 键 词：CrAlYN film bias voltage MICROSTRUCTURE PROPERTIES 

分 类 号：O484[理学—固体物理]