线性离子源对玻璃基片的表面改性  被引量:4

Surface Modification of Glass Substrate by Linear Ion Source

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作  者:孙瑶[1,2,3] 汪洪[1,2,3] 

机构地区:[1]中国建筑材料科学研究总院,北京100024 [2]国家玻璃深加工工程技术中心,北京100024 [3]绿色建筑材料国家重点实验室,北京100024

出  处:《硅酸盐学报》2015年第11期1561-1566,共6页Journal of The Chinese Ceramic Society

基  金:国家自然科学基金项目(51272245);"十二五"国家科技支撑计划项目(2013BAE12B01)

摘  要:采用阳极层线性离子源分别解离Ar气与O2气,对玻璃基片表面进行清洗处理,分析离子束清洗前后玻璃表面的变化,以及气体种类与电源电压对玻璃表面改性的影响。结果表明,离子束对玻璃表面产生显著的刻蚀作用,其中O离子束的刻蚀速率小于Ar,且刻蚀速率随电源电压的升高而增大。椭偏测试结果表明,离子束轰击增大了玻璃的Brewster角,并改变了Brewster角附近的椭圆偏振光谱形貌。通过建模分析发现,这是由于离子束使玻璃表面生成光密介质层,使表面折射率增大所致。Glass substrates were pre-cleaned with dissociated argon and oxygen using an anode layer linear ion source. The changes of g glass surfaces before and after ion beam treatment were analyzed, and the effects of gas species and power voltage on the surface modification of the glass were investigated. The results show that ion beam treatment has an etching effect on the glass surface. The etching rate of O ion beam is lower than that of Ar ion beam, and becomes greater when the power voltage increases. The ellipsometry results indicate that the Brewster angle of glass becomes greater and the elliptically polarized spectrum near the Brewster angle changes after ion beam treatment due to the increase of surface refraction index, arising from the existence of optically denser medium caused by ion beam according to the modeling analysis.

关 键 词:玻璃 Brewster角 表面改性 折射率 线性离子源 

分 类 号:TN305.8[电子电信—物理电子学] TQ171.65[化学工程—玻璃工业]

 

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