Ta/Pt双底层Co/Ni多层膜的反常霍尔效应  

Extraordinary Hall Effect on Co/Ni Multilayers with Ta/Pt Underlayer

作　　者：俱海浪[1,2] 李宝河[2] 刘帅[1] 于广华[1] 

机构地区：[1]北京科技大学材料科学与工程学院,北京100083 [2]北京工商大学理学院,北京102488

出　　处：《材料工程》2015年第11期19-23,共5页Journal of Materials Engineering

基　　金：国家自然科学基金资助项目(11174020)

摘　　要：通过JGP560A型磁控溅射仪制备了一系列以Ta/Pt为底层的Co/Ni多层膜样品,研究了多层膜中Pt缓冲层厚度、周期层中Co与Ni厚度以及多层膜周期数对样品反常霍尔效应和磁性的影响。结果发现:逐渐增厚的Pt层可以使样品的矫顽力增加,但是分流作用会导致样品的霍尔电阻降低,通过比较确定Pt缓冲层的厚度为2nm;磁性层中Co和Ni都处于一定厚度范围内时,多层膜的霍尔回线才能具有良好的矩形度,当厚度超出其特定范围时,多层膜的矩形度会变差,经过分析确定磁性层中Co和Ni的厚度为均0.4nm;磁性层的周期数对样品的性能也有着显著的影响,最终通过对周期数优化获得的最佳样品结构为Ta(2nm)Pt(2nm)Co(0.4nm)Ni(0.4nm)Co(0.4nm)Pt(1nm),该样品的霍尔回线矩形度非常好,霍尔信号明显,该样品总厚度在7nm以内,可进一步研究其在垂直磁纳米结构中的应用。A series of Co/Ni multilayers with Ta/Pt underlayer were prepared by magnetron sputtering technique. The effect of Pt, Co, Ni thickness and the periodic number on the performance of anoma- lous Hall effect of Co/Ni multilayers was investigated. The results show that gradually thickened Pt layer leads to an increase in coercivity and lessening Hall resistance and the thickness of Pt is deter- mined as 2nm. The multilayers have strong perpendicular anisotropy due to the thickness of Co and Ni in a certain range and the thickness of Co and Ni is tested as 0.4nm. Finally, through the optimization of the periodic number the best multilayer structure is acquired as Ta（2nm）Pt（2nm）Co（0.4nm）Ni （0.4nm）Co（0.4nm）Pt（lnm） for the rectangularity of its anomalous Hall loop is very good which shows that it has good perpendicular magnetic anisotropy and the total thickness is with in 7nm.

关 键 词：Co/Ni多层膜 反常霍尔效应 垂直磁各向异性 

分 类 号：O484.3[理学—固体物理]