氧分压对ZnO:Eu^(3+),Li^+薄膜结构和光学性质的影响  

Influence of Oxygen Pressure on Structure and Optical Properties of ZnO: Eu^(3+),Li^+ Films

作　　者：董艳锋[1] 李清山[2] 

机构地区：[1]曲阜师范大学物理工程学院,山东曲阜273165 [2]鲁东大学物理学院,山东烟台264025

出　　处：《中国稀土学报》2015年第6期676-681,共6页Journal of the Chinese Society of Rare Earths

基　　金：国家自然科学基金资助项目(10974077);曲阜师范大学博士启动基金(2012052)

摘　　要：利用脉冲激光沉积(PLD)法在Si(111)衬底上制备了ZnO:Eu^(3+),Li+薄膜,分别通过XRD谱和光致发光(PL)谱测试研究了氧分压不同时薄膜结构和发光性质。XRD谱研究表明,所有样品均仅出现ZnO基质的(002)衍射峰,说明Eu^(3+)已进入ZnO基质晶格,没有单独形成结晶氧化物。PL谱研究表明,当用325 nm的光激发样品时,样品的发光仅由ZnO基质的紫外发光和绿光发射组成,没有出现稀土Eu^(3+)的特征发光峰。当用395 nm的光激发样品时,在594和613 nm处出现两个明显的Eu^(3+)特征发光峰,分别属于Eu^(3+)的磁偶极跃迁(~5D_0→~7F_1)和电偶极跃迁(~5D_0→~7F_2),而且随着氧压的增加,594 nm处的发光峰强度变化不大,但613 nm处的发光峰强度明显增强。Eu3 ＋ and Li co-doped ZnO films were deposited on Si （ 111 ） substrates, and the films were character- ized by XRD and photoluminescence （PL） spectra at different oxygen pressure. The XRD spectra showed that the 3＋ ZnO：Eu ,Li films are highly c-axis, and no other crystal orientations are observed, which indicated that Eu3ions was successfully incorporated into ZnO crystals. When excited at the wavelength of 325 nm, the emission spec- tra of all samples room temperature electron transition wavelength of 395 were belonging to showed an UV band peaking at 380 nm and a wide band peaking at 512 nm. The UV emission at was thought to originate from free excitonic emission, and the green emission corresponds to the from the bottom of the conduction band to the antisite defect Ozn level. When irradiated under the rim, two obvious emission peaking at about 594 nm and 613 nm from Eu3 ＋ were observed, which the magnetic dipolar transition 5 Do-7 F1 and the electric dipolar transition 5 D0-7 F2 respectively. The intensity of 613 nm increased sharply when the oxygen pressure increased.

关 键 词：ZnO:EU3+ Li+薄膜 脉冲激光沉积 XRD 光致发光 

分 类 号：O484.4[理学—固体物理]