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作 者:黄建[1] 向鹏飞[1] 陈红兵[1] 李仁豪[1]
出 处:《半导体光电》2015年第5期728-732,共5页Semiconductor Optoelectronics
摘 要:介绍了彩色CCD的器件结构和成像原理,采用彩色光刻胶光刻法实现了彩色滤光片的制备,并通过分析彩色滤光片缓冲层、滤光片厚度和固化工艺等对滤光片性能的影响,获得了彩色滤光片的片上集成技术,并将其集成在512×512帧转移CCD器件上,完成了性能评价与成像验证。测试结果表明:制备的彩色滤光片主线透过率大于80%,光谱串扰小于15%,色纯度大于75%,集成该滤光片的彩色CCD成像色彩空间与sRGB相当,能够满足大多数CCD相机彩色成像的要求。The fabrication and integration technology of CCD color filter were presented in this paper.The device structure and imaging principle of color CCD were introduced firstly.Then,the color filter fabrication process was achieved by color photoresist exposure.And the integration technology was obtained by adding color filter buffer layer and optimizing filter thickness and consolidation process.The practicability of this technology was verified by testing the performances of the 512×512frame transfer color CCD.Test results show that main line transmittance of the color filter is higher than 80%,the spectral crosstalk is less than 15% and the color space of the CCD integrated with color filter is equivalent to sRGB,which can meet the requirements of color imaging of most CCD cameras.
分 类 号:TN386.5[电子电信—物理电子学]
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