光伏企业硅片清洗废水处理工程实例  

Case study on the treatment of wafer cleaning wastewater from photovoltaic industry

作　　者：刘倩倩 王玉玲[2] 王丽 齐伟 

机构地区：[1]保定天威英利新能源有限公司,河北保定071051 [2]中国环境管理干部学院环境工程系,河北秦皇岛066004

出　　处：《工业水处理》2015年第12期90-92,共3页Industrial Water Treatment

摘　　要：采用混凝沉淀—UASB—A/O处理系统—二次沉淀工艺对光伏企业硅片清洗废水进行处理,介绍了工程设计参数、UASB厌氧反应器和A/O处理单元的启动过程及处理工程运行情况。运行结果表明:出水COD、SS、分别为117、71 mg/L,去除率分别为95.4%、96.2%,达到《电池工业污染物排放标准》(GB 30484—2013)中的间接排放限值要求。该工艺运行稳定,是一种可靠的硅片清洗废水处理工艺。The combined process,coagulation sedimentati on-UASB-A/O treatment system-secondary sedimentation,has been used for treating the wafer cleaning wastewater from photovoltaic industry. The design parameter of the project,the starting processes of UASB reactor and A/O treatment system and the operation status of the treatment project are introduced. The operation results indicate that the COD and SS of the effluent are 117 mg/L and 71 mg/L,respectively,and their removing rates are 95.4% and 96.2%,respectively,meeting the requirements of the indirect discharge limit value specified in the Emission Standard of Pollutants for Battery Industry（GB 30484—2013）. The process runs stably,being a kind of reliable process for treating wafer cleaning wastewater.

关 键 词：光伏企业 硅片清洗废水 上流式厌氧污泥床反应器 A/O处理系统 

分 类 号：X703[环境科学与工程—环境工程]