高功率脉冲电流对磁控溅射TiN薄膜结构及力学性能影响  

Synthesis of TiN Coatings by High Power Pulsed Magnetron Sputtering and Its Mechanical Properties

作　　者：李永健[1] 孔营[1] 胡健[1] 耿慧远[1] 巩春志[1] 田修波[1] 

机构地区：[1]哈尔滨工业大学先进焊接与连接国家重点实验室,哈尔滨150001

出　　处：《真空科学与技术学报》2015年第12期1483-1488,共6页Chinese Journal of Vacuum Science and Technology

基　　金：国家自然科学基金项目(51175118;U1330110)

摘　　要：采用高功率脉冲磁控溅射技术在M2高速钢基体上沉积了TiN薄膜,研究了不同脉冲电流下TiN膜层的沉积速率、膜基结合力、晶体生长取向、纳米硬度和摩擦磨损性能等。结果表明:随着脉冲电流的增加,膜层沉积速率不断增大,膜层致密度逐渐增强。当脉冲电流增加到20A以上时膜层沿着(111)面择优生长并且具有最高的I_(111),这与能流密度效应有关。脉冲电流为20A时的膜层表面具有最高的硬度(可达25GPa)、最高的膜基结合力(可达70N,压痕评定优于HF2)和较好的耐摩擦磨损性能。The TiN thin films were deposited by high power pulsed magnetron sputtering（ HPPMS） on substrates of high-speed steel. The influence of the deposition conditions,including but not limited to the pulsed current,ratio of N2 and Ar flow-rates,and substrate temperature,on the microstructures and mechanical properties of the TiN coatings were investigated with X-ray diffraction,scanning electron microscopy and conventional mechanical probes. The results show that depending significantly on the pulsed current,the TiN coatings improved the mechanical behavior of the substrates,such as the nano-hardness,Young＇s modulus,wear-resistance,friction coefficient and interfacial adhesion. To be specific,as the pulsed current increased,both the hardness and Young; s modulus changed in an increase – decrease mode; the growth-rate and compactness increased. Grown at 20 A,the strongest surface hardness and interfacial adhesion of the TiN coatings,with（ 111） preferential growth orientation,were 25 GPa and 70 N,respectively.

关 键 词：高功率脉冲磁控溅射 TIN 脉冲电流 膜层结构 力学性能 

分 类 号：TB43[一般工业技术]