飞秒脉冲激光沉积钕掺杂薄膜特性研究  

Characterization of Nd Doped Films Prepared by Femtosecond Pulsed Laser Deposition

作　　者：杨先衡 冯国英[1] 易家玉[1] 王树同[1] 周寿桓[1] 

机构地区：[1]四川大学电子信息学院激光微纳工程研究所,四川成都610065

出　　处：《光谱学与光谱分析》2015年第9期2483-2486,共4页Spectroscopy and Spectral Analysis

基　　金：国家自然科学基金项目(60890200);NSAF基金项目(10976017)资助

摘　　要：采用脉冲激光沉积(PLD)技术在Si(100)衬底上生长了Nd∶YAG薄膜以及Nd∶Glass薄膜,利用扫描电子显微镜(SEM)、能谱仪(EDS)、傅里叶变换红外光谱仪(FTIR)、光学掺量振荡器(OPO)以及光栅光谱仪等测试装置分析了薄膜的表面和断面结构形貌、组成成分、光学吸收谱以及光致发光谱。结果表明:在室温衬底温度下生长的Nd∶YAG薄膜以及Nd∶Glass薄膜均呈无规则非定型结构,没有明显的取向性微晶生长;PLD生长的Nd∶YAG薄膜中存在0.15at.%化学计量比的Nd元素;Nd∶YAG块体靶材在750和808nm有两个明显的吸收峰,而薄膜没有明显的吸收峰;Nd∶YAG薄膜在808nm波长泵浦光下没有明显的光致发光谱峰,而Nd∶Glass薄膜在877和1 064nm波长处有明显的光致发光谱峰。说明在室温衬底温度下生长的Nd∶Glass薄膜中Nd元素以Nd3+光学活性离子形式掺杂进玻璃基质中,而Nd∶YAG薄膜中的Nd元素没有以Nd3+光学活性离子形式掺杂进YAG基质中。Thin films of Nd∶YAG and Nd∶Glass were prepared on Si（100）substrate by pulsed laser deposition technology. The morphology of film surface and cross section,composition,absorption spectrum and photoluminescence （PL）spectra of films were investigated by scanning electron microscope （SEM）,energy disperse spectroscopy （EDS）,Fourier transform infra-red spectrometer（FTIR）,optical parametric oscillator（OPO）and grating spectrometer.The results show that both Nd∶YAG films and Nd∶Glass films grown on the substrates at room temperature are amorphous.Nd∶YAG films grown by PLD contain Nd element with 0.15 at.% stoichiometric proportion.The absorption spectrum of bulk Nd∶YAG target rather than deposited films exhibit two absorption peaks at 750 and 808 nm.There are no evident peaks in the photoluminescence spectra curve of Nd∶YAG films.However,the photoluminescence spectra of Nd∶Glass films with two sharp peaks at the wavelength of 877 and 1 064 nm are observed.It indicates that Nd is doped into glass host as optically active Nd3 ＋ ions when Nd∶Glass films grow at room temperature.But for Nd∶YAG films,Nd don’t incorporate into YAG host as Nd3 ＋ ions.

关 键 词：脉冲激光沉积 结构形貌 光致发光谱 

分 类 号：O484[理学—固体物理]