化学级工业硅脱杂试验研究  

Removing of Impurities From Chemical Industrial Silicon

作　　者：袁野[1] 和晓才[1] 崔涛[1] 赖浚[1] 柯浪[1] 徐俊毅[1] 徐庆鑫[1] 许娜[1] 

机构地区：[1]昆明冶金研究院,云南昆明650031

出　　处：《湿法冶金》2016年第1期55-59,66,共6页Hydrometallurgy of China

摘　　要：针对目前国内高质量硅石资源不足,剩余硅石大多硅含量低、杂质含量高,难以满足化学级工业硅生产要求的问题,选取较有代表性的云南保山地区某矿山的硅石进行脱杂试验研究。通过钠化焙烧、清水浸出、CaO初步除杂、CO2沉淀分离、盐酸洗涤、焙烧等过程,硅石中的杂质得到有效脱除,获得符合化学级工业硅生产要求的高纯硅石。Aim at the shortage of domestic high quality silica resources which are mostly low silicon content and high impurity content, and difficult to meet the requirements of raw materials for producing chemical industrial silicon, the removing impurities process was studied. The test sample is from a mine in Baoshan, Yunnan. By the process of sodium roasting, water leaching, initial removing impurities using CaO, CO2 precipitation, hydrochloric washing and baking, impurities in silica are effectively removed, and high-purity silica which meets the requirements of raw material for producing chemical industrial silicon is obtained.

关 键 词：硅石 脱杂 钠化焙烧 浸出 CO2 沉淀 盐酸洗涤 

分 类 号：TQ127.2[化学工程—无机化工]