红外敏感硫化铅薄膜的化学机理探讨  

Discussion of Chemical Mechanism for Infrared Sensitive PbS Film

作　　者：魏小梅 李茂义 杨剑 孟锦 邹红军 张苗 陈松 刘博 

机构地区：[1]陕西华星电子集团有限公司即国营795厂,陕西咸阳712099

出　　处：《红外》2016年第1期14-17,共4页Infrared

摘　　要：硫化铅(PbS)薄膜光电性能的好坏决定了探测器的性能水平。PbS薄膜是制作PbS红外探测器的核心和基础,也是一直以来PbS探测器改进和提高的研究方向。分析了高温法、柯达法和联氨法共3种化学工艺形成硫化铅膜的反应机理。结果表明,光敏薄膜都涉及到PbSO_4的形成。X-RD衍射测试结果证明硫化铅多晶薄膜中存在PbSO_4,因此提出含有低浓度PbSO_4的PbS固溶体的形成是光敏薄膜具有光敏特性的原因之一。The photosensitive properties of PbS films can determine the performance of PbS detectors. The PbS films are the core and foundation of PbS infrared detectors and are also the research direction for the modification and improvement of PbS infrared detectors M1 the time. The reaction mechanisms of three processes including high temperature method, Kodak method and hydrazine method in the formation of PbS films are analyzed. The results show that the photosensitive films are all related to the formation of PbSO4. The X-ray diffraction test result shows that there are PbS04 in PbS poly-films. So, it suggests that the formation of the PbS solid solution containing low concentration PbS04 is one of the reasons for PbS films to have photosensitive properties.

关 键 词：硫化铅 红外探测器 化学机理 PbSO4 X-RD 

分 类 号：TN215[电子电信—物理电子学]