激光熔覆FeSiB非晶涂层工艺及组织  

Processing Optimization and Microstructure of FeSiB Am orphous Coating by Laser Cladding

作　　者：李娟[1] 王善林[1] 龚玉兵[1] 

机构地区：[1]南昌航空大学轻合金加工科学与技术国防重点学科实验室,江西南昌330063

出　　处：《中国激光》2016年第1期71-77,共7页Chinese Journal of Lasers

基　　金：国家自然科学基金(51461031;51565041);国家重点实验室开放基金(2013-Z05);江西省研究生创新专项资金项目(YC2014-S389);江西省教育厅科技落地计划项目(KJLD14055)

摘　　要：以厚度2 mm的低碳钢为基体材料,采用脉冲激光将厚度约为25 mm的Fe-Si-B非晶带材熔覆在低碳钢基材表层。研究脉冲功率P、脉冲宽度T、脉冲频率F、光斑直径f等工艺参数对涂层表面成形、稀释率、组织结构和显微硬度的影响。研究结果表明,当P=18.4 W,T=3.2 ms,F=3.0 Hz,f=0.3 mm时,涂层成形良好、稀释率最低、结构致密,且与基材之间呈良好的冶金结合。随着脉冲功率增大,涂层越容易发生晶化,且晶化相α、涂层、Fe2B及Fe3Si的含量和种类均增加。随着脉冲功率增大,涂层厚度增大,但涂层显微硬度下降;涂层中部显微硬度值最高,可达1400 H V,远高于低碳钢基材的100 H V。Using the substrate of mild steel with thickness of 2 mm, Fe-Si-B amorphous ribbon with thickness of about 25 μm is cladded on substrate surface by pulse laser. The effects of pulse power P, pulse width W, pulse frequency F, beam diameter f of the pulse laser on the formation, the dilution rate, microstructure and microhardness of the coatings are investigated. The results show that the coating with well formation, the lowest dilution rate, lower pore density, and chemical bonding with substrate is obtained, when P=18.4 W, T=3.2 ms, F= 3.0 Hz, f=0.3 mm. With the increase of laser power, the crystallization in coating happens easily, and the contents and categories of crystallization phase of α-Fe, Fe2B and Fe3Si are increased, moreover, the thickness of coating increases while the microhardness of coating decreases. The highest microhardness in central coating is about 1400 HV , exceeding extensively that of mild steel with 100 HV.

关 键 词：材料 激光熔覆 铁基非晶带材 涂层 显微组织 

分 类 号：TG174.4[金属学及工艺—金属表面处理]