溶剂退火和热退火双重优化对P3HT:PCBM活性层形貌和性能的影响  

Effect of Sol-Therm Dual Optimization on the Performance and Morphology of P3HT:PCBM Active Layer

作　　者：阿拉塔[1] 宁君[1] 阿日木申 张天臣[1] 松林[1] 

机构地区：[1]内蒙古师范大学内蒙古功能材料物理与化学重点实验室,内蒙古呼和浩特010022

出　　处：《内蒙古师范大学学报（自然科学汉文版）》2015年第6期772-775,779,共5页Journal of Inner Mongolia Normal University(Natural Science Edition)

基　　金：内蒙古自治区重大基础研究开放课题;内蒙古师范大学引进人才启动资金项目(2013YJRC002)

摘　　要：采用旋涂法制备了聚3-已基噻吩(P3HT)和富勒烯衍生物【6.6】-苯基-C61-丁酸甲酯(PC61BM)的共混薄膜,通过调控制备过程中活性层的旋涂时间及热退火温度,研究了溶剂退火结合热退火的双重优化对活性层形貌和性能的影响.利用紫外-可见光(UV-ViS)吸收光谱、原子力显微镜(AFM轻敲模式)和X射线衍射光谱(XRD)等测试手段,分别对P3HT︰PCBM活性层的形貌和性能进行了表征,结果表明,该制备方法可以有效地改善P3HT:PCBM活性层的形貌和性能.The morphology of active layer of polymer solar cells strongly depend on preparation conditions. A Spin coating-method was used to prepare P3HT/PCBM active layer. The effect of solvent annealing and thermal annealing dual optimization on the performance and morphology of active layer is studied by adjusting the spin-coating time and annealing temperature in the preparation process. The morphology and performance of the P3 HT.PCBM active layer were characterized by UV-Vis spectroscopy, atomic force microscopy （AFM） and X-ray diffraction （XRD） analyses. The results showed that Our preparation method can effectively improve the morphology and performance of P3HT.PCBM active layer.

关 键 词：P3HT:PCBM薄膜 光吸收 微观形貌 

分 类 号：TB332[一般工业技术—材料科学与工程]