A new kind of chelating agent with low pH value applied in the TSV CMP slurry  

作　　者：洪姣 刘玉岭 张保国 牛新环 韩力英 

机构地区：[1]School of Electronic Information Engineering, Hebei University of Technology [2]Tianjin Key Laboratory of Electronic Materials and Devices

出　　处：《Journal of Semiconductors》2015年第12期143-146,共4页半导体学报（英文版）

基　　金：supported by the Major National Science and Technology Special Projects(No.2009ZX02308);the Fund Project of Hebei Provincial Department of Education,China(No.QN2014208);the Natural Science Foundation of Hebei Province,China(No.E2013202247);the Colleges and Universities Scientific Research Project of Hebei Province,China(No.Z2014088)

摘　　要：TSV（through silicon via） is an emerging technology, which can realize micromation compared with the conventional packaging and extend Moore＇s law. Chemical mechanical polishing（CMP） is one of the most important steps in the process of TSV manufacture, and it is an enabling technology to extend Moore＇s law in the past two decades. Low pressure, low abrasive and low p H value are the main requirements for copper interconnection.In this paper, the effect of different kinds of TSV slurry with FA/OⅡ or FA/O IV type chelating agent on CMP are studied. All kinds of slurry used in this study are alkaline with no added inhibitors. From the experiment results, it can be seen that the copper removal rate and surface roughness achieved by using the FA/OⅣ type chelating agent with a low p H value is superior to using the FA/OⅡ type chelating agent.TSV（through silicon via） is an emerging technology, which can realize micromation compared with the conventional packaging and extend Moore＇s law. Chemical mechanical polishing（CMP） is one of the most important steps in the process of TSV manufacture, and it is an enabling technology to extend Moore＇s law in the past two decades. Low pressure, low abrasive and low p H value are the main requirements for copper interconnection.In this paper, the effect of different kinds of TSV slurry with FA/OⅡ or FA/O IV type chelating agent on CMP are studied. All kinds of slurry used in this study are alkaline with no added inhibitors. From the experiment results, it can be seen that the copper removal rate and surface roughness achieved by using the FA/OⅣ type chelating agent with a low p H value is superior to using the FA/OⅡ type chelating agent.

关 键 词：low pH value alkaline slurry removal rate ROUGHNESS 

分 类 号：TN305.2[电子电信—物理电子学]