固结磨料抛光LBO晶体非水基抛光液优化  

Optimization of non-water based slurry in fixed abrasive polishing of LBO crystal

作　　者：宋龙龙[1] 李军[1] 王文泽[1] 胡章贵[2] 朱永伟[1] 左敦稳[1] 

机构地区：[1]南京航空航天大学机电学院,南京210016 [2]中国科学院理化技术研究所功能晶体与激光技术重点实验室,北京100190

出　　处：《功能材料》2016年第2期2051-2054,共4页Journal of Functional Materials

基　　金：国家自然科学基金资助项目(51175260);中国博士后科学基金资助项目(2014M551586);江苏省博士后科研计划资助项目(1302069B)

摘　　要：三硼酸锂(LBO)晶体是优良的非线性光学晶体材料,抛光后晶体表面水份残留导致晶体潮解,影响器件的使用性能。采用非水基抛光液固结磨料抛光LBO晶体,降低水含量,研究非水基抛光液中去离子水、乳酸、双氧水等含量对材料去除率和表面粗糙度的影响,并综合优化得到高材料去除率和优表面质量的抛光液组分。研究表明,抛光液中去离子水浓度16%、乳酸22%、双氧水5%为最优抛光液组分,采用优化的抛光液固结磨料抛光LBO晶体的材料去除率达到392nm/min,表面粗糙度为0.62nm,实现了LBO晶体表面的高效高质量抛光,同时避免了抛光过程中水的大量使用。Lithium triborate(LBO)crystal was an excellent nonlinear optical crystal material.The residual water on crystal surface results in crystal deliquescence after polishing,which affects the use of the device.In this article,fixed abrasive polishing of LBO crystal using non-water based slurry was used,which reduced the water content.The influence of the concentration of deionized water,lactic acid,hydrogen peroxide on material removal rate and surface roughness were investigated.And the slurry components was optimized to achieve high material removal rate and good surface finish.The results show that deionized water 16%,lactic acid 22%,hydrogen peroxide 5%in non-water based slurry are the optimal combination.In this case,material removal rate achieves 392nm/min and surface roughness is 0.62 nm in fixed abrasive polishing of LBO crystal.The high efficiency and high quality polishing method for LBO crystal comes true,which avoids to use a lot of water at the same time.

关 键 词：固结磨料抛光 非水基抛光液 材料去除率 表面粗糙度 

分 类 号：O786[理学—晶体学] TG356.28[金属学及工艺—金属压力加工]