水热-煅烧法制备亚微米CeO_2抛光粉  

Preparation of Submicron Ceria Polishing Powder via Hydrothermal-Calcination Method

作　　者：李静[1] 常民民 孙明艳[2] 汤光平[2] 周雪珍[3] 周新木[1] 李永绣[1] 

机构地区：[1]南昌大学化学学院,江西南昌330031 [2]中国工程物理研究院机械制造工艺研究所,四川绵阳621900 [3]南昌大学材料科学与工程学院,江西南昌330031

出　　处：《中国稀土学报》2016年第1期44-49,共6页Journal of the Chinese Society of Rare Earths

基　　金：中物院超精密加工技术重点实验室开放基金(KF13005);工信部稀土专项资助

摘　　要：采用硝酸铈为原料,聚乙烯吡咯烷酮为添加剂水热法合成CeO2前驱体,所得前驱体在不同温度下煅烧制备CeO2抛光粉,研究了煅烧温度对产品物性和抛光性能的影响。结果表明：水热合成的前驱体为直径～100 nm的类球形均匀颗粒;随煅烧温度的升高,产品结晶度提高,粒度逐渐增大,对K9玻璃的材料去除率先增大而后降低,在1050℃达到极大值。为此,确定了合成中位粒径在200～400 nm之间的CeO2高效抛光粉的最佳条件。Ceria precursor was synthesized via hydrothermal method by using cerium nitrate as raw material and polyvinylpyrrolidone（ PVP） as additive. The resulting precursor was calcined at various temperatures to obtain ceria polishing powder. The influence of the calcination temperature on the physical properties and polishing performance of the products was investigated. The results showed that the precursor has uniform quasi-spherical morphology with diameter of ～ 100 nm and the products exhibited improved crystallinity and increasing particle size with elevated calcination temperature. The material removal rate（ MRR） for K9 glass first rose and then declined as increasing calcination temperature,which display ed an maximum value at 1050 ℃. The optimal conditions for preparation of efficient ceria polishing powder with median particle size of 200 ～ 400 nm was determined.

关 键 词：水热-煅烧法 亚微米氧化铈 抛光 

分 类 号：O614.33[理学—无机化学]