不同冷屏黑化工艺BRDF指标对比分析  

Test and analysis of average BRDF in different blackening processes of cold shield

作　　者：卢加涛[1] 张新宇[1] 李艳红[1] 

机构地区：[1]华北光电技术研究所,北京100015

出　　处：《激光与红外》2016年第2期196-199,共4页Laser & Infrared

摘　　要：冷屏作为红外探测器的重要部件,其内壁消光质量的优劣,直接关系到探测器背景噪声、动态范围和响应均匀性。针对当前正在应用的几种冷屏黑化工艺,通过制备平面样品,测试其在红外谱段2~14μm的平均BRDF数据,结合分析几种工艺方法的特点及实际应用效果,为后续不同类型、不同谱段红外探测器冷屏内壁设计选用何种黑化工艺提供建设性建议。Cold shield is an important part of IR detector,and the extinction quality of its inner wall directly affects the background noise,dynamic range and response uniformity of IR detector. Using several blackening processes of cold shield,flat samples were prepared. The average BRDF in 2 ~ 14μm infrared waveband was tested. According to test results,the characteristics of several techniques and practical application effects were analyzed,which provide the constructive suggestions for the design of cold shield inner wall of IR detector in different wavebands.

关 键 词：冷屏 黑化 平均BRDF 

分 类 号：TN214[电子电信—物理电子学]