浅析晶圆湿法清洗方式中常见的电气控制  

The Common Electrical Control of Wafer Wet Cleaning Method

作　　者：张峰 吕麒鹏 张润 杜斌 

机构地区：[1]太原艺星科技有限公司,山西太原030024

出　　处：《山西电子技术》2016年第1期19-20,27,共3页Shanxi Electronic Technology

摘　　要：晶圆湿法清洗设备是半导体行业中最普遍和必须的设备,其电气控制由于环境的因素有其特殊性和专业性,清洗设备中的电气控制需要配合其清洗的特殊工艺而实现。同时清洗中具有强腐蚀性,也应该考虑电气设备的安全耐腐防护。Wafer wet cleaning equipment is the most common and necessary equipment in the semiconductor industry, its electrical control parts have its particularity and specialization because of the environmental factors. The electrical control in the eleaning equipment needs to be matched with the special process of cleaning. At the same time it has strong eorrosivity in cleaning, so the durability corrosion protection should also be considered for the safety of eleetrieal equipment.

关 键 词：计量泵 流量计 QDR 旋转甩干 

分 类 号：TN305.97[电子电信—物理电子学]