电弧离子镀TiN/Ti纳米多层膜的力学性能  

Mechanical properties of Ti N/Ti nano-multilayers prepared by arc-ion plating

作　　者：张臣[1] 黄美东[1] 陈泽昊[1] 程芳[1] 王宇[1] 

机构地区：[1]天津师范大学物理与材料科学学院,天津300387

出　　处：《真空》2016年第1期8-11,共4页Vacuum

摘　　要：采用多弧离子镀技术,在不同沉积参数下合成具有纳米调制周期的TiN/Ti多层膜。利用X射线衍射仪(XRD)、扫描电子显微镜(SEM)、XP-2台阶仪、XP型纳米压痕仪、X射线能谱仪(EDS)研究了调制周期对TiN/Ti纳米多层膜微观结构、表面形貌以及力学性能的影响。结果表明,膜层由TiN和Ti交替组成,不存在其它杂相,且TiN薄膜以面心立方结构沿(111)密排面择优生长;TiN/Ti多层膜外观致密、平滑、颜色均匀金黄,随着调制周期的减小,薄膜表面大颗粒数量和尺寸均减小,且氮含量逐渐升高,膜层硬度呈现出增大的趋势。TiN/Ti multilayered films, consisting of Ti and TiN layer with different thickness, were prepared by are ion plating technique at room temperature. Mierostructure, surface morphology, thickness and hardness of the films were investigated by XRD, SEM, profiler and nanoindenter, respectively. The results show that only Ti and TiN phases are found, while no other phase ：ex- ists. The preferential growth orientation of the film is at TiN （111） obviously. TiN/Ti muhilayered films were compact, smooth and golden yellow. The size and numbers of macroparticle of the films are considerably decreased. The hardness of TiN/Ti muliti-lay- ered films decreased gradually with the increase of the modulation period, shows the modulation period is one of the most impor- tant factors affecting the hardness of the TiN/Ti muliti-layered films.

关 键 词：电弧离子镀 TiN/Ti多层膜 调制周期 

分 类 号：O484.4[理学—固体物理]