氮化硅陶瓷滚子磁流变、化学与超声复合抛光工艺试验  

Polishing Processing Test for Silicon Nitride Ceramic Rollers Based on Magnetorheological and Chemo-Ultrasonic Compound Technology

作　　者：张占立[1,2] 熊明照 王恒迪[1] 王锋[1] 邓四二[1] 

机构地区：[1]河南科技大学机电工程学院,河南洛阳471003 [2]机械装备先进制造河南省协同创新中心,河南洛阳471003

出　　处：《轴承》2016年第2期14-19,共6页Bearing

基　　金：国家科技部国防科工委基金项目(JPT-125-171);河南省杰出人才创新基金项目(144200510020);洛阳市科技计划项目(1301016A)

摘　　要：为实现氮化硅陶瓷滚子抛光的高效、高精度要求,提出磁流变、化学与超声复合的抛光工艺方法。分析复合抛光的加工机理;利用试验机,在不同工艺参数下进行了复合抛光工艺试验,分析各主要工艺参数对抛光材料去除率和滚子表面粗糙度的影响规律,确定出复合抛光的最佳工艺参数。结果表明:复合抛光后陶瓷滚子表面粗糙度Ra由0.3μm减小至0.03μm;在最佳工艺参数下,滚子能够在保持较高材料去除率的同时获得较好的表面质量;材料去除过程主要是磁流变抛光的剪切作用、超声波抛光的冲击作用以及抛光过程中一系列化学反应综合作用的结果。In order to realize high efficiency and high precision requirements for polishing of silicon nitride ceramic roller, a polishing processing method is presented based on magnetorheological and chemo - ultrasonic compound technology. The machining mechanism of compound polishing is analyzed, and the compound polishing processing test is carried out under different technological parameters. The effects of main technological parameters on removal rate of polishing material and surface roughness of rollers are analyzed, and the optimum technological parameters are determined. The results show that the surface roughness of ceramic roller is reduced from 0. 3 μm to 0. 03μm after compound polishing. The good surface quality and high material removal rate are obtained under the optimum technological parameter. The material removal process is the result of the shear effect of magnetorheological polishing, the impact effect of ultrasonic polishing, and a series of chemical reactions during polishing process.

关 键 词：滚动轴承 陶瓷滚子 磁流变液 超声波 化学抛光 工艺试验 

分 类 号：TH133.33[机械工程—机械制造及自动化] TM271[一般工业技术—材料科学与工程]