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作 者:朱丽慧[1] 胡涛[1] 宋诚[1] 孟吉炜 刘振宇 刘一雄
机构地区:[1]上海大学材料科学与工程学院,上海200072 [2]Kennametal Inc.
出 处:《硬质合金》2015年第6期359-363,共5页Cemented Carbides
基 金:教育部"卓越工程师教育培养计划"(上海大学金属材料工程专业);美国Kennametal公司资助项目
摘 要:采用阴极电弧蒸镀在WC-Co硬质合金基体上沉积Ti_(0.45)Al_(0.55N)、Ti_(0.35)Al_(0.55)Si_(0.1)N和Ti_(0.3)Al_(0.55)Cr_(0.15)N涂层,并在900℃下对涂层试样真空退火30 min和120 min。采用X射线衍射仪和显微维氏硬度计分析比较退火前后涂层的物相及硬度,研究Si、Cr的加入对Ti Al N涂层热稳定性能的影响。结果表明:在Ti Al N涂层中加入Si、Cr后涂层的硬度增加。900℃退火后,Ti_(0.45)Al_(0.55)N涂层的硬度逐渐下降,Ti_(0.35)Al_(0.55)Si_(0.1)N和Ti_(0.3)Al_(0.55)Cr_(0.15)N涂层的硬度则呈上升趋势,并且Ti_(0.3)Al_(0.55)Cr_(0.15)N涂层的硬度始终保持最高,而Ti_(0.45)Al_(0.55)N涂层的硬度最低。Si、Cr的加入能推迟涂层退火过程中软质的密排六方Al N相的形成,Cr还能延缓面心立方(TiAl)N相的调幅分解。Si、Cr的加入有效改善TiAlN涂层的热稳定性能,Ti_(0.3)Al_(0.55)Cr_(0.15)N涂层的热稳定性优于Ti_(0.35)Al_(0.55)Si_(0.1)N。Ti0.45Al0.55N、Ti0.35Al0.55Si0.1N and Ti0.3Al0.55Cr0.15N coatings were deposited on WC-Co cemented carbide by cathode arc evaporation and then annealed at 900 ℃ in vacuum for 30 rain and 120 rain. X-ray diffraction and Vickers hardness tester were used to study the effect of Si or Cr addition on the phase, hardness and thermal stability of the coatings. The results show that the addition of Si or Cr helps to increase the hardness of the Ti0.45Al0.55N coating. After being annealed at 900 ℃, the hardness of the Ti0.45Al0.55N decreases gradually, while the hardness of the Ti0.35 Al0.55Si0.1N and Ti0.3Al0.55Cr0.15N tends to increase. The as-deposited and as-annealed Ti0.35Al0.55Cr0.15N coatings possess the highest hardness, and the Ti0.45Al0.55N coating exhibits the lowest hardness. The addition of Si or Cr can inhibit the formation of soft hcp-AIN during annealing. The addition of Cr can also delay the spinodal decomposition of fcc-(TiAl)N. The addition of Si or Cr can effectively improve the thermal stability of the TiAIN coatings. The thermal stability of the Ti0.3Al0.55Cr0.15N coating is superior to that of the Ti0.35Al0.55Si0.1N coating.
关 键 词:TIALN涂层 阴极电弧蒸镀 热稳定性 相结构 硬度
分 类 号:TG174.4[金属学及工艺—金属表面处理]
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