光敏性纳米SiO_2的制备与应用  

Preparation and Properties of Photosensitive Modified Nano- Silica

作　　者：路璐[1] 韦军[2] 

机构地区：[1]常州大学材料科学与工程学院,江苏常州213164 [2]盐城工学院材料工程学院,江苏盐城224051

出　　处：《涂料工业》2016年第3期1-5,共5页Paint & Coatings Industry

基　　金：江苏省高校自然科学研究重大项目(11KJA430010);江苏省青蓝工程(学科带头人);江苏省产学研前瞻性联合研究项目(BY2015057-27)

摘　　要：首先以甲苯二异氰酸酯(TDI)与夺氢型光引发剂4,4’-二羟基二苯甲酮(DHBP)以及共引发剂N-甲基二乙醇胺(MDEA)合成了主链含有光引发剂及共引发剂胺的—NCO封端的光敏性聚氨酯预聚体,后利用活性端—NCO与硅羟基反应将光敏性预聚体接枝到纳米SiO_2表面,最后将光敏性纳米SiO_2分散到聚氨酯丙烯酸酯(PUA)中,用光固化法制备了PUA/纳米SiO_2杂化膜。通过红外光谱和核磁共振氢谱证实了光敏性纳米SiO_2的分子结构,以热失质量法、紫外光谱仪等研究了光固化涂膜的性能。结果表明,光敏性纳米SiO_2可显著提高光固化涂膜的热稳定性和机械性能,并且涂膜的透明性优于添加未改性纳米SiO_2的涂膜。NCO-terminated photosensitive polyurethane prepolymer, with its backbone chain containing hydrogen-abstraction photoinitiator and coinitiator, was prepared by the reac- tion of toluene diisocyanate （TDI）, 4,4＇-dihydroxydiphenyl （DHBP）, and N-methyldi- ethanolamine （MDEA）. Then, the photosensitive prepolymer was grafted onto the surface of nano-silica based on the reaction of the terminated active NCO groups with silanols. Finally, the photosensitive modified nano-silica was dispersed into polyurethane acrylate （PUA） resin and cured by UV light to form a PUA/SiO2 hybrid nano-structured film. FT-IR and 1H-NMR were used to confirm the structure of photosensitive nano- silica. TGA analysis, Ultraviolet spectrometer and other analyzing methods were used to investigate the properties of UV-curing films. The results indicated that the photosensitive nano-silica, compared with the unmodified one, could significantly improve the thermal stability and mechanical properties as well as transparency of the cured coating.

关 键 词：光敏性 纳米SIO2 聚氨酯 光固化 

分 类 号：TQ637.83[化学工程—精细化工]