永磁薄膜材料的研究进展  

Research advance in permanent magnetic thin film materials

作　　者：郭韦[1] 倪经[1] 周俊[1] 曹照亮 陈彦[1] 

机构地区：[1]西南应用磁学研究所,四川绵阳621000

出　　处：《磁性材料及器件》2016年第1期61-66,共6页Journal of Magnetic Materials and Devices

基　　金：总装武器装备预研基金重点项目(9140A23070512DZ19071)

摘　　要：永磁薄膜是相关电子器件及系统小型化、集成化的关键材料。首先概括介绍了永磁薄膜的常用制备技术,包括电沉积、溅射、激光脉冲沉积等方法。在此基础上,总结了各种永磁薄膜(金属合金、铁氧体、稀土化合物等)的国内外研究进展,以及在相关器件上的应用。最后展望了永磁薄膜的发展趋势和前景。Permanent magnetic thin films are essential to related integrated electronic devices and systems. Several major manufacturing technologies of permanent magnetic films, including electro-deposition, sputtering, pulsed laser deposition are introduced. Research progress of permanent magnetic thin film（metallic alloy, ferrite, and rare earth compound） and some applications on the device are also reviewed. Finally, a prospect for research of the permanent magnetic thin film is presented.

关 键 词：永磁薄膜 工艺 性能 应用 

分 类 号：TM273[一般工业技术—材料科学与工程]