微粗糙基底上多层涂层光散射偏振建模与特性研究  

Polarization Modeling and Analysis of Light Scattering Properties of Multilayer Films on Slightly Rough Substrate

作　　者：曹慧[1] 高隽[1] 王玲妹[1] 王驰[1] 

机构地区：[1]合肥工业大学图像信息处理研究室,安徽合肥230009

出　　处：《光谱学与光谱分析》2016年第3期640-647,共8页Spectroscopy and Spectral Analysis

基　　金：国家自然科学基金项目(61271121)资助

摘　　要：为满足多层涂层目标的偏振探测需求,基于一阶矢量扰动理论,结合偏振传输矩阵,建立微粗糙基底上多层涂层的光散射偏振双向反射分布函数模型,研究多因素影响下两种典型涂层目标,单层减反射涂层和多层高反射涂层的光散射偏振特性,结果表明单层减反射涂层目标的偏振度受观测位置影响,峰值左侧的偏振度较之裸基底增大,右侧反之,探测不同观测角下的偏振度可区分无涂层和涂层目标。不同观测角和入射波长下,多层高反射涂层目标的偏振度与涂层层数和涂层光学厚度显著相关,层数增加,多层涂层在镜反射附近具有去偏作用。仿真结果符合测量数据,验证了多涂层目标散射偏振模型的正确性与合理性,为实现多涂层目标偏振探测和反射隐身技术提供理论依据。To satisfy the demand of multilayer films on polarization detection,polarized bidirectional reflectance distribution function of multilayer films on slightly rough substrate is established on the basis of first-order vector perturbation theory and polarization transfer matrix.Due to the function,light scattering polarization properties are studied under multi-factor impacts of two typical targets-monolayer anti-reflection film and multilayer high-reflection films.The result shows that for monolayer antireflection film,observing positions have a great influence on the degree of polarization,for the left of the peak increased and right decreased compared with the substrate target.Film target and bare substrate can be distinguished by the degree of polarization in different observation angles.For multilayer high-reflection films,the degree of polarization is significantly associated with the number and optical thickness of layers at different wavelengths of incident light and scattering angles.With the increase of the layer number,the degree of polarization near the mirror reflection area decreases.It reveals that the calculated results coincide with the experimental data,which validates the correctness and rationality of the model.This paper provides a theoretical method for polarization detection of multilayer films target and reflection stealth technology.

关 键 词：散射 多层涂层目标 偏振双向反射分布函数 偏振度 穆勒矩阵 

分 类 号：O436.3[机械工程—光学工程]