脉冲电流密度对纳米晶镍镀层结构及性能的影响  

Effects of Pulse Current Density on the Microstructure and Properties of Electrodeposited Nanocrystalline Nickel Coating

作　　者：朴楠[1] 陈吉[1] 孙彦伟[1] 许志显 陈晓明[1] 韩啸[2] 

机构地区：[1]辽宁石油化工大学机械工程学院石油化工过程腐蚀与防护技术中心,辽宁抚顺113001 [2]甘肃蓝科石化高新装备股份有限公司,甘肃兰州730000

出　　处：《电镀与环保》2016年第2期4-7,共4页Electroplating & Pollution Control

基　　金：辽宁省自然科学基金(No.201202127);辽宁省高等学校杰出青年学者成长计划项目(No.LJQ2011033)

摘　　要：采用脉冲电沉积方法在黄铜基体上制备出致密、平整的纳米晶镍镀层。研究了脉冲电流密度对镀镍层的微观结构、硬度及耐蚀性的影响。结果表明:当脉冲电流密度为5A/dm^2时,镀镍层为(200)晶面择优;当脉冲电流密度增至10A/dm^2时,镀镍层变为(111)晶面择优;当脉冲电流密度继续增至20A/dm^2和30A/dm^2时,镀镍层变为(111)、(200)双向择优。随着脉冲电流密度的增大,镀镍层的晶粒尺寸略微减小,硬度逐渐增大,在3.5%的NaCl溶液中的耐蚀性下降。脉冲电流密度为5A/dm^2时所得镀镍层的耐蚀性最好。Nanocrystalline nicke coating with compact and smooth surface was prepared on brass substrate by using pulse electrodeposition, and effects of pulse current density on the microstructure, hardness and corrosion resistance were investigated. Results showed that the preferred orientation of nickel coating was （200） at 5 A/dm^2 , and was （111） at 10 A/dm^2 , while it was （111） and （200） double preferred orientation when at 20 A/dm^2 and 30 A/dm^2. With the increasing of pulse current density, the grains refined, the hardness increased and the corrosion resistance in 3. 5% NaCl solution decreased. The nickel coating prepared at 5 A/dm^2 with the best corrosion resistance.

关 键 词：纳米晶镍镀层 脉冲电沉积 硬度 耐蚀性 脉冲电流密度 

分 类 号：TQ153[化学工程—电化学工业]