氮化硼二维纳米材料剥离制备技术研究进展  

Research Progress in Boron Nitride Two-dimensional Nanomaterials Stripping Technology

作　　者：刘闯[1,2,3] 张力[1] 李平[2,3] 陈永安[1,2,3] 崔雯雯[2,3] 张海林[2,3] 

机构地区：[1]北京有色金属研究总院稀有金属冶金材料研究所,北京100088 [2]中国科学院过程工程研究所湿法冶金清洁生产技术国家工程实验室,北京100190 [3]中国科学院过程工程研究所绿色过程与工程重点实验室,北京100190

出　　处：《材料工程》2016年第3期122-128,共7页Journal of Materials Engineering

基　　金：国家自然科学基金(51574212;U1403195)

摘　　要：氮化硼二维纳米材料具有与石墨烯相当的强度、较宽的带隙、优良的化学稳定性和热稳定性,在绝缘、含氧、高温的条件下具有独特的应用价值,其制备技术及性能的研究是近年来材料科学领域研究的热点之一。剥离制备方法尤其是化学剥离法具有成本低、质量好、容易控制等优点,是制备氮化硼二维纳米材料的有效方法。本文详述了各种剥离方法制备氮化硼二维纳米材料的现状、存在的问题,指出深入研究剥离机理、开发新型高效剥离方法、制备稳定单层氮化硼应该是今后本领域的重点研究方向。Boron nitride two-dimensional nanomaterials with a similar structure of graphene have a unique application value at insulated,oxygenated and high temperature environmental conditions due to its wide band gap,excellent chemical and thermal stabilities.Research on preparation and properties is one of the hot areas in material science.The exfoliating technology,especially chemical exfoliation,plays an important role in the preparation of the boron nitride two-dimensional nanomaterials because of low cost,high quality and controllability.This review described in detail progress and research status,and pointed out that exfoliation mechanism,development of new effective exfoliating methods,preparation of stable monolayer boron nitride would be the key areas in the future.

关 键 词：无机非金属材料 剥离技术 综述 氮化硼 化学剥离 

分 类 号：TB34[一般工业技术—材料科学与工程]