对痕量甲醛气体敏感的SnO_2-NiO纳米材料的X射线光电子谱研究  

X-ray Photoelectron Spectroscopy Study of SnO_2-NiO-material Sensitive to Trace Formaldehyde Gas

作　　者：吕品[1] 张绍成[2] 唐祯安[3] 

机构地区：[1]辽宁大学物理学院,辽宁沈阳110036 [2]辽宁大学计算中心,辽宁沈阳110036 [3]大连理工大学电子和信息工程学院,辽宁大连116023

出　　处：《辽宁大学学报（自然科学版）》2016年第1期32-36,共5页Journal of Liaoning University：Natural Sciences Edition

基　　金：国家自然科学基金资助项目(90207003)

摘　　要：本文研究了对痕量甲醛气体敏感的SnO_2-NiO纳米材料的X射线光电子谱(XPS).通过对XPS O1s和Sn3d5/2分峰的分析证实了SnO_2-NiO纳米材料是氧化态.在SnO_2-NiO纳米材料的表面观察到了SnO_2、SnO、NiO和Ni_2O_3,而以SnO_2为主要成分,NiO含量很低.由于掺杂了低浓度NiO使SnO_2-NiO纳米材料表面吸附氧的数量极大地增加,从而增加了材料表面反应活性点,进而使SnO_2-NiO纳米材料对痕量甲醛(HCHO)气体的气敏性能大大提高.In this paper,the XPS study of SnO_2-NiO nano-material sensitive to trace formaldehyde（ HCHO） gas is presented.The oxidation states of SnO_2-NiO material are confirmed by the shape analysis of corresponding XPS O1 s and Sn3d5 /2peaks using the decomposition prodecure.SnO_2、Sn O、NiO and Ni_2O_3 were observed on the surface of SnO2-NiO nano-material while SnO_2 was dominated and NiO was low.The quantity of adsorbed oxygen on the surface of SnO_2-NiO nano-material is greatly increased due to the NiO-doped.The gas-sensing property of SnO_2-NiO nano-material is greatly improved to HCHO.

关 键 词：X射线光电子谱 SnO2-NiO纳米材料 甲醛气体 吸附氧 

分 类 号：TN389[电子电信—物理电子学]