Subsurface defect characterization and laser-induced damage performance of fused silica optics polished with colloidal silica and ceria  

作　　者：何祥 王刚 赵恒 马平 

机构地区：[1]Chengdu Fine Optical Engineering Research Center, Chengdu 610041, China

出　　处：《Chinese Physics B》2016年第4期413-417,共5页中国物理B（英文版）

摘　　要：This paper mainly focuses on the influence of colloidal silica polishing on the damage performance of fused silica optics. In this paper, nanometer sized colloidal silica and micron sized ceria are used to polish fused silica optics. The colloidal silica polished samples and ceria polished samples exhibit that the root-mean-squared （RMS） average surface roughness values are 0.7 nm and 1.0 rim, respectively. The subsurface defects and damage performance of the polished optics are analyzed and discussed. It is revealed that colloidal silica polishing will introduce much fewer absorptive con- taminant elements and subsurface damages especially no trailing indentation fracture. The 355-nm laser damage test reveals that each of the fused silica samples polished with colloidal silica has a much higher damage threshold and lower damage density than ceria polished samples. Colloidal silica polishing is potential in manufacturing high power laser optics.This paper mainly focuses on the influence of colloidal silica polishing on the damage performance of fused silica optics. In this paper, nanometer sized colloidal silica and micron sized ceria are used to polish fused silica optics. The colloidal silica polished samples and ceria polished samples exhibit that the root-mean-squared （RMS） average surface roughness values are 0.7 nm and 1.0 rim, respectively. The subsurface defects and damage performance of the polished optics are analyzed and discussed. It is revealed that colloidal silica polishing will introduce much fewer absorptive con- taminant elements and subsurface damages especially no trailing indentation fracture. The 355-nm laser damage test reveals that each of the fused silica samples polished with colloidal silica has a much higher damage threshold and lower damage density than ceria polished samples. Colloidal silica polishing is potential in manufacturing high power laser optics.

关 键 词：POLISHING laser-induced damage fused silica colloidal silica 

分 类 号：TN305.2[电子电信—物理电子学]