干涉实验明暗条纹公式及条纹级次的讨论  

Discussion on Light and Dark Stripes Formula and Stripe Orders in Interference

作　　者：李玉强[1] 

机构地区：[1]伊犁师范学院物理科学与技术学院,新疆伊宁835000

出　　处：《伊犁师范学院学报（自然科学版）》2016年第1期91-96,共6页Journal of Yili Normal University：Natural Science Edition

基　　金：伊犁师范学院教育教学改革项目(JG201104;JG201312)

摘　　要：针对现有教材对明、暗条纹干涉级次描述的不统一,通过分析光程差的对称性讨论构建明、暗条纹级次的取值,确定了杨氏双缝、夫琅禾费单缝衍射、平面光栅衍射图样中明、暗条纹公式.薄膜干涉实验中,级次k的取值采用光程差对称分布时的右半区间描述,在考虑半波损失的情况下,给出了符合上述形式的等倾和等厚干涉光程差的数学表达式.In view of being not unitary on description of light and dark stripes interference orders in the exist-ing teaching materials, the value of stripes orders was determined through the analysis of the symmetry of opticalpath difference, light and dark stripes formula on the Young＇s double slit, single slit diffraction and grating diffrac-tion pattern was established. In thin-film interference experiment, the value of k order is in accord with the rightrange description when optical path difference distributes symmetrically, the mathematical expressions of isoclinicinterference and equal- thickness thickness interference optical path difference that are in accordance with theabove forms were acquired under the considering the half-wavelength loss.

关 键 词：干涉 光程差 条纹级次 

分 类 号：O436-1[机械工程—光学工程]