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作 者:张扬
机构地区:[1]大连市市政设计研究院有限责任公司,辽宁大连116011
出 处:《中国给水排水》2016年第7期75-77,共3页China Water & Wastewater
摘 要:采用纯硅粉配制含硅废水来模拟半导体工业含硅废水,分析了硅粉粒度及分布,考察了配水的稳定性、动态膜的形成情况及过滤性能。结果表明:模拟含硅废水的水质稳定、重现性好;较高浓度的模拟含硅废水形成动态膜约需23 h,动态膜形成时跨膜压差小(仅2.5 k Pa)、出水浊度低(0.57 NTU);通过曝气(0.8 L/min)和周期性排水(一个过滤周期约为3 d)可以控制动态膜维持低压(<7.5 k Pa)过滤,不需要对基膜进行清洗,动态膜运行稳定,出水浊度接近于零。实际应用中可以对定期排出的浓缩含硅废水进行脱水,从而回收高纯硅。The synthetic silicon-containing wastewater was prepared using the pure silicon powder to simulate the real silicon-containing semiconductor wastewater. The particle size and distribution of silicon powder were analyzed, and the stability of the simulated silicon-containing wastewater and the formation and filtration performance of the dynamic membrane were investigated. The resuhs showed that the synthetic silicon-containing wastewater had stable quality and good repeatability. By using the simulated silicon-containing wastewater with high concentration, the dynamic membrane was formed within about 23 h, the trans-mcmbrane pressure was small (only 2.5 kPa) , and the effluent turbidity was low (0.57 NTU). The fihration of the dynamic membrane could be achieved under low pressure (below 7.5 kPa) through aeration (0.8 L/min) and periodic drainage (3 d). The cleaning of base membrane was not re- quired, the dynamic membrane was stable and the effluent turbidity was close to zero. In practice, the periodically drained concentrated silicon-containing wastewater could be dewatered, thereby recovering the high purity silicon.
分 类 号:X703[环境科学与工程—环境工程]
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