红外增透薄膜的研究进展  

Research Progress of Infrared Antireflection Thin Films

作　　者：何远东[1] 张伟才[1] 闫萍[1] 杨洪星[1] 

机构地区：[1]中国电子科技集团公司第四十六研究所,天津300220

出　　处：《节能技术》2016年第2期125-128,138,共5页Energy Conservation Technology

摘　　要：红外增透膜已被广泛的应用于现代光学系统,并直接决定了光学器件性能的优劣,特别是对于航空航天领域具有十分重要的现实意义。红外增透膜的常见制备方法有真空蒸发、电子束蒸发、化学气相沉积法等。文章着重介绍国内外关于红外增透膜的研究进展,综述红外增透膜材料的选择、常规红外增透膜材料的改性、红外增透膜系的设计及新型红外增透膜材料的开发,预测了红外增透膜材料未来的发展趋势。特别关注膜材料的红外透过率及机械强度等性能,明确不同红外增透膜的工作波段及应用前景。As vital components,Infrared antireflection thin films play a critical role in the modern optical system,especially in thefield of aerospace. The common fabrication of infrared antireflection thin films including vacuum evaporation,electron beam evaporation and chemical vapor deposition. This paper reviewes the research progress of infrared antireflection thin films,summarizes materialssuit to prapare infrared antireflection thin films and the design of infrared antireflection coating,forecasts the development of infrared antireflection thin films. A particular emphasis is given to the transmittance and mechanical strength of these films,which make sense to explore their potential application.

关 键 词：光学薄膜 红外增透膜 透过率 机械强度 改性 

分 类 号：TN214[电子电信—物理电子学]