Hybrid Simulation of Duty Cycle Influences on Pulse Modulated RF SiH_4/Ar Discharge  

作　　者：王喜凤 宋远红 赵书霞 戴忠玲 王友年 

机构地区：[1]School of Physics and Optoelectronic Technology,Dalian University of Technology

出　　处：《Plasma Science and Technology》2016年第4期394-399,共6页等离子体科学和技术（英文版）

基　　金：supported by National Natural Science Foundation of China(No.11275038)

摘　　要：A one-dimensional fluid/Monte-Carlo（MC）hybrid model is developed to describe capacitively coupled SiH_4/Ar discharge,in which the lower electrode is applied by a RF source and pulse modulated by a square-wave,to investigate the modulation effects of the pulse duty cycle on the discharge mechanism.An electron Monte Carlo simulation is used to calculate the electron energy distribution as a function of position and time phase.Rate coefficients in chemical reactions can then be obtained and transferred to the fluid model for the calculation of electron temperature and densities of different species,such as electrons,ions,and radicals.The simulation results show that,the electron energy distribution f（ε）is modulated evidently within a pulse cycle,with its tail extending to higher energies during the power-on period,while shrinking back promptly in the afterglow period.Thus,the rate coefficients could be controlled during the discharge,resulting in modulation of the species composition on the substrate compared with continuous excitation.Meanwhile,more negative ions,like Si H_3^-and Si H_2^-,may escape to the electrodes owing to the collapse of ambipolar electric fields,which is beneficial to films deposition.Pulse modulation is thus expected to provide additional methods to customize the plasma densities and components.A one-dimensional fluid/Monte-Carlo（MC）hybrid model is developed to describe capacitively coupled SiH_4/Ar discharge,in which the lower electrode is applied by a RF source and pulse modulated by a square-wave,to investigate the modulation effects of the pulse duty cycle on the discharge mechanism.An electron Monte Carlo simulation is used to calculate the electron energy distribution as a function of position and time phase.Rate coefficients in chemical reactions can then be obtained and transferred to the fluid model for the calculation of electron temperature and densities of different species,such as electrons,ions,and radicals.The simulation results show that,the electron energy distribution f（ε）is modulated evidently within a pulse cycle,with its tail extending to higher energies during the power-on period,while shrinking back promptly in the afterglow period.Thus,the rate coefficients could be controlled during the discharge,resulting in modulation of the species composition on the substrate compared with continuous excitation.Meanwhile,more negative ions,like Si H_3^-and Si H_2^-,may escape to the electrodes owing to the collapse of ambipolar electric fields,which is beneficial to films deposition.Pulse modulation is thus expected to provide additional methods to customize the plasma densities and components.

关 键 词：hybrid model EEDF pulse modulation SiH_4/Ar mixture 

分 类 号：TN787[电子电信—电路与系统]