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作 者:吴霜[1] 刘波[1] 邱志澈 陈士伟[1] 张娟楠[1] 刘小林[1] 顾牡[1] 黄世明[1] 倪晨[1]
机构地区:[1]同济大学物理科学与工程学院,上海市特殊人工微结构材料与技术重点实验室,上海200092
出 处:《无机材料学报》2016年第4期372-376,共5页Journal of Inorganic Materials
基 金:国家自然科学基金(11574230;11374229)~~
摘 要:LuTaO_4是一种新型的辐射探测材料,但是制备高质量的透明薄膜面临着巨大挑战。为了在保证薄膜不开裂与高透明度的前提下提高薄膜的厚度,通过大量摸索选用聚乙烯吡咯烷酮(PVP)为胶黏剂并优化溶胶中固含量及PVP含量成功制备出单层厚度达到100nm的LuTaO_4:Ln^(3+)(Ln=Eu,Tb)薄膜,保证了薄膜的透明度同时大大提高了发光性能。该方法为高质量LuTaO_4:Ln^(3+)(Ln=Eu,Tb)厚膜的制备和应用奠定了基础。Lu Ta O4 is a kind of novel material for radiation detectors, but using it to prepare high-quality and transparent thin film is of great challenges. In our previous study, high-quality Lu Ta O4 thin film was prepared with thickness of single film only about 60 nm, but multilayers film easy to crack. In this study, to ensure no cracking and high transparency of thin film, PVP was chosen as adhesive and single Lu Ta O4:Ln^(3+)(Ln=Eu,Tb) film of 100 nm was prepared by modulating solid and PVP content through lots of exploration, with improved luminescence properties and high transparency simultaneously. This method lays the foundations for preparation of high-quality applicable Lu Ta O4:Ln^(3+)(Ln=Eu,Tb) thick film.
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