水射流抛光去除函数对面形误差修正的影响  

Effect of Material Removal Function on Surface Shape Error Correction in Fluid Jet Polishing

作　　者：吕亮[1] 马平[1] 朱衡[1] 黄金勇[1] 王刚[1] 

机构地区：[1]成都精密光学工程研究中心,四川成都610041

出　　处：《中国激光》2016年第4期245-252,共8页Chinese Journal of Lasers

摘　　要：研究了水射流抛光条件下的去除函数特征,根据去除函数的一维轮廓特征采用分段解析函数拟合方法建立了去除函数的解析表达式。根据解析表达式采用Matlab数值模拟方法对不同参数条件下的去除函数进行了一维叠加去除模拟,引入波纹度均方根值Wrms指标,对均匀去除与线性去除条件下不同参数对去除函数一维误差修正的影响进行了讨论。通过两轮水射流抛光实验,使F50 mm熔石英玻璃面形峰谷值λPV由0.148λ收敛至0.062λ,90%与75%口径范围分别收敛至0.048λ与0.032λ。面形均方根值λrms由18.86 nm收敛至4.87 nm,90%与75%口径范围内分别收敛至3.67 nm与3.15 nm。Material removal function characteristics in fluid jet polishing are discussed. According to the onedimensional profile characteristics of the material removal function, the analytical formulas of the removal function are established. Based on the formulas, the Matlab numerical simulation is utilized to simulate the one-dimensional material removal process under the partial overlap condition and different parameters. The root mean square of the waviness Wrmsis introduced to discuss the effect of different parameters on one-dimensional error correction under the constant removal process and the linear removal process. The optimized parameters are adopted in the subsequent fluid jet polishing experiments. The polishing results on F50 mm fused silica glass show that the peakvalley value of surface shape lPVdecreases from 0.148 l to 0.062 l after two rounds of experiments. Especially, lPV decreases to 0.048 l for 90% aperture, and to 0.032 l for 75% aperture. The root mean square of surface shape lrms decreases from 18.86 nm to 4.87 nm, especially to 3.67 nm for 90% aperture, and 3.15 nm for 75% aperture.

关 键 词：光学制造 水射流抛光 去除函数 熔石英 

分 类 号：TN205[电子电信—物理电子学]