X射线荧光光谱法测定工业硅中十二种杂质元素  

Determination on 12 Impurities in Industrial Silicon by X-ray Fluorescent Spectrometry

作　　者：刘英波[1] 杨毅[1] 杨海岸[1] 杨谅孚[1] 罗舜[1] 

机构地区：[1]昆明冶金研究院,云南昆明650031

出　　处：《云南冶金》2016年第2期132-136,共5页Yunnan Metallurgy

摘　　要：建立了X射线荧光光谱粉末压片法,可同时对工业硅样品中铁、铝、钙、锰、镍、钛、铜、磷、镁、铬、钒、钴十二种元素进行定量测定。工业硅样品中加入淀粉作黏结剂,以硼酸作垫衬剂压制成样片后,在选定的仪器分析条件下进行测定,该方法检测速度快,精度高,结果准确。The quantitative determination of 12 elements that iron, aluminum, calcium, manganese, nickel, titanium, copper, phosphorus, magnesium, chromium, vanadium, cobalt in the industrial silicon sample, by X-ray fluorescent spectrometry powder tablet com- pressing is established. Starch is served as bonding agent and added into the industrial silicon sample, the boronic acid is served as PAD agent and made into tablets, the sample tablets determination is carried out under the selected instrument analysis condition with the rapid speed, high precision and accurate results.

关 键 词：X射线荧光光谱法 工业硅中杂质元素 准确度 精密度 

分 类 号：O657.34[理学—分析化学]