二氧化硅与液体介质的亲和性表征  

Compatibility Characterization of Silica with Liquid Medium

作　　者：杜翠鸣[1] 邢燕侠 柴颂刚[1] 郝良鹏 陈文欣[1] 

机构地区：[1]广东生益科技股份有限公司,国家电子电路基材工程技术研究中心,东莞523808

出　　处：《无机化学学报》2016年第5期777-781,共5页Chinese Journal of Inorganic Chemistry

摘　　要：利用动态核磁脉冲(Dynamic NMR)技术对高浓度的二氧化硅浆料的亲和性进行研究,并建立表征束缚层厚度与亲和性的定量模型。结果表明,在纯丁酮溶剂中,二氧化硅的含量越高,分散时间越长,填料表面束缚层厚度越大;而在树脂溶液体系中,在30%二氧化硅含量附近,填料表面束缚层厚度最大。当处理剂用量约为0.5%(w/w)时,颗粒表面与介质的吸附作用最强。使用不同处理剂制备的二氧化硅浆料,其表面吸附效应也有所不同,并且当浆料静置16 h后,其厚度层发生不同的变化,在丁酮体系中,束缚层厚度部分增加,而甲苯体系中,束缚层厚度减小。The compatibility of high silica content slurry were studied by using dynamic nuclear magnetic resonance （NMR） technique, and the quantitative model for the characterization of the adsorption layer thickness and affinity was established. The result showed that in the pure methyl ethyl ketone （MEK） solvents system, higher silica content and longer dispersing time, thicker thickness of the adsorption layer was. While in the resin solution system, the thickest thickness of surface adsorption layer was at about 30% silica content. The interaction strength of particle and solvent was strongest when dealing with about 0.5%（w/w） of treating agent. Moreover, there was great different thickness of adsorption layer with different treating agent and different standing time. In the MEK system, the surface-bound solvent increased after standing 16 h, while in the toluene system, the surface-bound solvent decreased.

关 键 词：动态核磁脉冲 二氧化硅浆料 界面特性 弛豫时间 

分 类 号：TM215[一般工业技术—材料科学与工程]