三角形硅烯纳米结构的等离激元激发  

Plasmon Excitation in Triangle Silicene Nanostructures

作　　者：尹海峰[1] 陈文经[1] 张红[2] 

机构地区：[1]凯里学院物理与电子工程学院,凯里556011 [2]四川大学物理科学与技术学院,成都610065

出　　处：《材料导报》2016年第8期149-152,共4页Materials Reports

基　　金：国家自然科学基金(11464023;11474207);凯里学院原子与分子物理重点学科(KZD2014002);贵州省普通高等学校创新人才团队(黔教合人才团队字[2012]06号)

摘　　要：基于含时密度泛函理论,研究了等边三角形硅烯纳米结构的等离激元特性。沿三角形所在平面方向激发时,体系中有2个主要的等离激元共振带,其线形基本相同。这一特性与体系的边界构型以及尺度大小无关。沿垂直于纳米结构所在的平面方向激发时,体系中有2个等离激元共振带,分别位于6.8eV和15eV附近。这2个主要等离激元共振带的线形与三角形的大小以及边界的构型无关,其共振强度依赖于体系尺度的大小。Plasmon characteristic in equilateral triangle silicene nanostructures were investigated using time-de-pendent density functional theory. Along the triangle plane direction, there were two main plasmon bands. The linear shapes of two main plasmon bands were the same, regardless of the boundary configuration and the nanostructure scale size. Two main plasmon resonance bands were observed running perpendicular to the direction to the silicone nano-structure plane around 6. 8 eV and 15 eV. The linear shapes of the two main plasmon bands are independent of the boundary configuration and the triangle scale size. The plasmon resonance intensity of the main plasmon bands de-pends on the system size scale.

关 键 词：等离激元 硅烯 含时密度泛函理论 

分 类 号：O43[机械工程—光学工程]