超强脉冲激光在密度递增等离子体中自聚焦的PIC模拟  

THE PIC SIMULATION OF THE SELF-FOCUSING OF ULTRA-INTENSE PULSE LASER IN PLASMA WITH RAMPED DENSITY PROFILE

作　　者：胡强林[1] 周身林[1] 余晓光[1] 罗小兵[1] 

机构地区：[1]井冈山大学数理学院,江西吉安343009

出　　处：《井冈山大学学报（自然科学版）》2016年第3期20-24,共5页Journal of Jinggangshan University (Natural Science)

基　　金：国家自然科学基金项目(51461020;11064005);江西省原子与分子物理重点学科项目(2011-2015)

摘　　要：采用Epoch代码模拟研究了强度达到1022 Wcm^(-2)的激光脉冲,在密度递增等离子体中的自聚焦过程。模拟结果表明,在此过程中,脉冲先经历成丝过程,然后光丝快速汇聚,形成聚焦;在聚焦过程中,可产生超陡脉冲激光,脉冲峰值强度与初始脉冲峰值强度相比可提高近20倍,达到1023 Wcm^(-2)量级。The self-focusing process of ultra-intense pulse, peak intensity up to 1022 Wcm^-2, in plasma with ramped density profile is simulated using Epoch code. The simulation results shows that in the process, the pulse experiences a filamentation instability process first, and then the filament gathered quickly and forming the focus. In this process, a super steep pulse is formed, and the peak intensity enhanced almost 20 times higher than the peak intensity of the initial pulse, and reach to the order of 1023 Wcm^-2.

关 键 词：PIC粒子模拟 等离子体 超强激光脉冲 自聚焦 

分 类 号：O437[机械工程—光学工程]