强磁场作用下原子扩散行为的研究进展  

Advance in Atom Diffusion Behavior Under High Magnetic Field

作　　者：丁亮[1] 牛涛[2] 张艳苓[2] 覃继宁[1] 范同祥[1] 侯红亮[2] 

机构地区：[1]上海交通大学金属基复合材料国家重点实验室,上海201112 [2]中航工业北京航空制造工程研究所,北京100024

出　　处：《航空制造技术》2016年第11期64-68,共5页Aeronautical Manufacturing Technology

基　　金：国家重点基础研究计划项目(NO2011CB012803)

摘　　要：在材料电磁过程研究中,有关强磁场在材料扩散连接领域的研究和实践已取得了巨大成果,强磁场下原子扩散行为的研究可以为其工业应用提供依据。综述了强磁场对间隙扩散和空位扩散影响的研究结果和机制,对存在的问题进行了归纳总结,并对强磁场下扩散连接的研究趋势和发展前景进行了展望。The studies and applications of high magnetic field in the field of material DB process have made great achievement. Research of atom diffusion behavior in high magnetic field can provide the basis for its industrial application. The influence results and mechanisms of high magnetic field on interstitial diffusion as well as vacancy diffusion are reviewed respectively in details and discrepancies among these results are summarized. The trends and potential prospects of DB process under a high magnetic field are also discussed.

关 键 词：强磁场 间隙扩散 空位扩散 影响机制 

分 类 号：O441.4[理学—电磁学]