含羧基的席夫碱型聚硅氧烷液晶的合成及其液晶性能  

Synthesis and Liquid Crystalline Properties of Carboxylic Schiff Base Polysiloxane Liquid Crystal

作　　者：张立眉[1] 高建峰[2] 张立成[1] 王赫 

机构地区：[1]中国铝业公司,北京100082 [2]中北大学理学院化学系,山西太原030051 [3]中国航天科工集团第四研究院,湖北武汉430040

出　　处：《合成化学》2016年第6期507-509,536,共4页Chinese Journal of Synthetic Chemistry

摘　　要：对羟基苯甲醛与对胺基苯甲酸缩合制得刚性基元（1）;3-溴丙烯与对羟基苯甲酸经取代反应制得对烯丙氧基苯甲酸（2）;2经加成和酰氯化后,与1经酯化反应合成了含羧基的席夫碱型聚硅氧烷液晶（5）,其结构经IR确证。对5的液晶性能进行了测试。结果表明：5属于近晶型条带织构;5具有较高的熔点和清亮点温度,液晶区间在180.34～251.11℃。The gigid primitive （1） was prepared by coupling reaction of p-hydroxy benzaldehyde with para-aminobenzoic acid. The substitution of 3-allyl bromide and para hydroxy benzoic acid resulted in 4-（allyloxy）benzoic acid（2）, which was reacted by addition and acylating chlorination, and then es- terificated with 1 to obtain Schiff base polysiloxane crystal （5）. The structure was confirmed by IR. The liquid crystalline property was tested. DSC demonstrated that 5 belonged to sematic banded tex- ture5and had high melting point and clear temperature. The liquid crystal interval was 180.34 - 251.11 ℃.

关 键 词：聚硅氧烷 席夫碱 液晶 条带织构 合成 液晶性能 

分 类 号：O634[理学—高分子化学]