Optimal Design of 850nm 2 × 2 Multimode Interference Polymer Waveguide Coupler by Imprint Technique  

作　　者：Yuchen SHAO Xiuyou HAN Xiaonan HAN Zhili LU Zhenlin WU Jie TENG Jinyan WANG Geert MORTHIER Mingshan ZHAO 

机构地区：[1]School of Physics and Optoelectronic Engineering, Dalian University of Technology, Dalian, 116024, China [2]School of Chemical Engineering, Dalian University of Technology, Dalian, 116024, China [3]No. 38 Research Institute, China Electronics Technology Group Corporation, Hefei, 230088, China [4]Photonics Research Group,, Department of Information Technology, Ghent University-IMEC, 9000 Ghent, Belgium

出　　处：《Photonic Sensors》2016年第3期234-242,共9页光子传感器（英文版）

基　　金：This work was supported in part by the International Science ＆ Technology Cooperation Program of China （No. 2014DFG32590）, National Natural Science Foundation of China （No.61077015, 61307040）, National R＆D Program （No.2012AA040406）, Natural Science Foundation of Liaoning Province （No. 2014020002）, Opening Project of Shanghai Key Laboratory of All Solid-state Laser and Applied Techniques （No. 2013ADL04）, and Fundamental Research Funds for the Central Universities （DUT 13JB01, DUT 15ZD231, and DUT2015TD47）.

摘　　要：A 2 × 2 optical waveguide coupler at 850 nm based on the multimode interference （MMI） structure with the polysilsesquioxanes liquid series （PSQ-Ls） polymer material and the imprint technique is presented. The influence of the structural parameters, such as the single mode condition, the waveguide spacing of input/output ports, and the width and length of the multimode waveguide, on the optical splitting performance including the excess loss and the uniformity is simulated by the beam propagation method. By inserting a taper section of isosceles trapezoid between the single mode and multimode waveguides, the optimized structural parameters for low excess loss and high uniformity are obtained with the excess loss of -0.040 dB and the uniformity of-0.007 dB. The effect of the structure deviations induced during the imprint process on the optical splitting performance at different residual layer thicknesses is also investigated. The analysis results provide useful instructions for the waveguide device fabrication.A 2 × 2 optical waveguide coupler at 850 nm based on the multimode interference （MMI） structure with the polysilsesquioxanes liquid series （PSQ-Ls） polymer material and the imprint technique is presented. The influence of the structural parameters, such as the single mode condition, the waveguide spacing of input/output ports, and the width and length of the multimode waveguide, on the optical splitting performance including the excess loss and the uniformity is simulated by the beam propagation method. By inserting a taper section of isosceles trapezoid between the single mode and multimode waveguides, the optimized structural parameters for low excess loss and high uniformity are obtained with the excess loss of -0.040 dB and the uniformity of-0.007 dB. The effect of the structure deviations induced during the imprint process on the optical splitting performance at different residual layer thicknesses is also investigated. The analysis results provide useful instructions for the waveguide device fabrication.

关 键 词：Polymer waveguide COUPLER multimode interference 

分 类 号：TN622[电子电信—电路与系统] TN256