X80钢种高温氧化膜生长机理研究  

Research of Oxide Film Formation Mechanism of X80 Steel Under High Temperature

作　　者：王畅[1] 于洋[1] 牛涛[1] 王林[1] 陈瑾[2] 

机构地区：[1]首钢技术研究院 [2]首钢股份公司迁安钢铁公司

出　　处：《首钢科技》2016年第3期9-15,共7页Shougang Science and Technology

摘　　要：研究了X80钢种在800—1200℃温度下氧化1rain的氧化膜及氧化质点形成规律。结果表明，X80钢种在1050℃以下具有良好的抗氧化特性；在1000℃模拟的氧化膜内侧存在明显的硅元素和铬元素富集带，当温度升高至1050℃时基体界面处开始出现氧化质点，内侧元素富集氧化膜完整性遭到破坏，这主要与Cr2O3进一步氧化形成CrO3有关；结合热力学计算和动力学分析发现，低于1000℃时硅和铬的氧化物稳定性高，自扩散系数小，利于在界面处形成稳定氧化膜。The formation mechanism of oxide film and oxidized round spot of X80 Steel under 800 ℃ - 1 200 ℃ for 1 minute was studied. The results showed that antioxidant properties of X80 were good when the temperature was lower than 1 050 ℃. A silicon and chromium element enrichment zone was found in the oxide film approaching the base steel side under 1 000 ℃. Oxidized round spots were found in the oxide film with poor integrity when the temperature rose to 1 050 ℃, which was related to further oxidation of Cr element, from Cr203 to CrO3. Combined with thermodynamics and kinetics analysis, it was found that silicon and chromium oxides were much stable and the selfdiffusion coefficient was small when the temperature was lower than 1 000 ℃, which contributed to the formation of oxide film with higher stability.

关 键 词：氧化膜 热重试验 X80 元素富集 

分 类 号：TQ175.71[化学工程—硅酸盐工业]